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Low-temperature catalyzed formation of segmented nanowire of dielectric material

  • US 20070004225A1
  • Filed: 06/30/2005
  • Published: 01/04/2007
  • Est. Priority Date: 06/30/2005
  • Status: Abandoned Application
First Claim
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1. A method of forming a segmented nanowire comprising:

  • providing a substrate;

    pre-cleaning said substrate;

    pre-treating said substrate;

    forming and placing a catalyst over said substrate; and

    forming said segmented nanowire over said catalyst with recurring pulses of plasma-enhanced chemical vapor deposition (PECVD) of a dielectric material.

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