Low vapor pressure gas delivery system and apparatus

• US 20070007879A1
• Filed: 07/11/2005
• Published: 01/11/2007
• Est. Priority Date: 07/11/2005
• Status: Abandoned Application

• Current Assignee: Praxair Technology Incorporated (Linde Plc)
• Original Assignee: Praxair Technology Incorporated (Linde Plc)
• Inventors: Chakravarti, Shrikar, Bergman, Thomas, Timm, Martin, Pace, Keith, Burgers, Kenneth, Tworek, Jessica
• Application Number:
  US11/177,291
• Publication Number:
  US 20070007879A1
• Time in Patent Office: Days
• US Class Current: 313/493
• CPC Class Codes: F17C 2221/05 Ultrapure fluid
• CPC Class Codes: F17C 2223/0153 Liquefied gas, e.g. LPG, GPL
• CPC Class Codes: F17C 2223/033 Small pressure, e.g. for liquefied gas
• CPC Class Codes: F17C 2223/046 in the liquid
• CPC Class Codes: F17C 2225/0123 gaseous, e.g. CNG, GNC
• CPC Class Codes: F17C 2225/035 High pressure, i.e. between 10 and 80 bars
• CPC Class Codes: F17C 2227/0107 by pressurising the ullage
• CPC Class Codes: F17C 2227/0304 using an electric heater
• CPC Class Codes: F17C 2227/0309 using another fluid
• CPC Class Codes: F17C 2227/0369 in or on a vessel
• CPC Class Codes: F17C 2227/0376 in wall contact
• CPC Class Codes: F17C 2227/0386 with a jacket
• CPC Class Codes: F17C 2227/0393 using a vaporiser
• CPC Class Codes: F17C 2227/047 by repeating a process cycle
• CPC Class Codes: F17C 2265/015 by separating
• CPC Class Codes: F17C 2265/017 different phases of a same fluid
• CPC Class Codes: F17C 2270/0518 Semiconductors
• CPC Class Codes: F17C 9/02 with change of state, e.g. vaporisation

Abstract

A system and apparatus for manufacturing a low vapor pressure vapor stream lean in low volatility contaminants, and delivering same to a point of use. The system provides a transport vessel having a liquid phase or two-phase fluid held therein. The liquid and/or two-phase is transferred from said transport vessel to a vaporization vessel, wherein at least part of the liquid is vaporized. A liquid stream that is enriched in low volatility contaminants is withdrawn from the vaporization vessel, and a stream that is lean in low volatility contaminants is withdrawn from the vaporization vessel. The low vapor pressure stream is delivered to a point of use and the purity is maintained within a desired range.

Claims

1. A system for transporting a low vapor pressure fluid and manufacturing a low vapor pressure stream containing primarily vapor, wherein the stream containing primarily vapor is lean in low volatility contaminants, and delivering the stream containing primarily vapor to a point of use, comprising:

providing a transport vessel having a liquid phase or two-phase low vapor pressure fluid contained therein;

transferring a portion of the liquid and/or two-phase low vapor pressure fluid from said transport vessel to a vaporization vessel, wherein at least part of the liquid is vaporized;

withdrawing a stream containing primarily liquid that is enriched in low volatility contaminants from the vaporization vessel; and

withdrawing a stream containing primarily vapor that is lean in low volatility contaminants from the vaporization vessel and delivering the stream containing primarily vapor to a point of use wherein the low volatility contaminant level of the stream containing primarily vapor is maintained within a desired range.

2. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, further comprising:

pressurizing the transport vessel through injection of a high pressure inert gas therein to transfer the liquid and/or two-phase fluid to the vaporization vessel.

3. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, further comprising:

withdrawing the liquid phase or two-phase stream from the vaporization vessel in a batchwise or discontinuous manner.

4. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, further comprising:

directing the vapor withdrawn from the vaporization vessel to a delivery panel which controls the flow rate, pressure and temperature of the low vapor pressure vapor stream delivered to the point-of-use.

5. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, wherein the point-of-use is a semiconductor, LED or LCD manufacturing tool.

6. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, further comprising:

pressurizing the transport vessel via a small amount of energy administered thereto.

7. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, further comprising:

heating the liquid contained in the vaporization vessel via a heat exchanger in which the liquid is boiled against a second liquid fluid.

8. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, wherein the liquid phase or two-phase fluid is a non-air based fluid selected from the group consisting of ammonia, hydrogen chloride, carbon dioxide, dichlorosilane, or a mixture thereof.

9. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, wherein the liquid level in the vaporization vessel is maintained within a range of about 1 percent to 95 percent of the vessel height.

10. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, wherein the flow rate of the low vapor pressure stream containing primarily vapor withdrawn from the vaporization vessel ranges from about 10 slpm to 2,000 slpm.

11. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, wherein the pressure in said vaporization vessel ranges from about 50 psig to 300 psig, and the temperature ranges from about 32°

F. to 125°

F.

12. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, further comprising:

purifying the low vapor pressure stream containing primarily vapor withdrawn from the second containment vessel in a further purification unit.

13. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 12, further comprising:

routing the low vapor pressure stream containing primarily vapor withdrawn from the vaporization vessel through a partial condensation device disposed upstream of the purification unit.

14. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, further comprising

routing the liquid stream withdrawn from the vaporization vessel to a waste container.

15. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 14, further comprising:

maintaining the pressure within the waste container in a range of about 1 psig to 100 psig.

16. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 14, further comprising:

recycling the liquid stream from the waste container to the transport vessel.

17. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 16, further comprising:

scrubbing the liquid stream recycled prior to its introduction into the transport vessel.

18. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, further comprising:

adjusting the rate at which the liquid stream is withdrawn from said vaporization vessel to maintain a desired purity.

19. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, wherein the ratio of the flow of the stream containing primarily liquid to the flow of the stream containing primarily vapor is maintained at a near constant level.

20. The system for manufacturing a low vapor pressure stream containing primarily vapor according to claim 1, wherein the flow rate of the stream containing primarily liquid withdrawn from the vaporization vessel is adjusted based on the measured contaminant level in the stream containing primarily vapor exiting the vaporization vessel.

21. The apparatus for manufacturing a low vapor pressure stream containing primarily vapor, wherein the stream containing primarily vapor is lean in low volatile contaminants, comprising:

a transport vessel having a liquid phase or two-phase fluid therein;

a vaporization vessel, to which the liquid phase or two-phase fluid is transferred and at least partially vaporized;

means for controlling the energy delivered to said vaporization vessel;

a first conduit connected to a lower part of the vaporization vessel through which a stream containing primarily liquid enriched in low volatile contaminants is withdrawn; and

a

a delivery panel connected via a second conduit to an upper part of the vaporization vessel through which a low vapor pressure stream containing primarily vapor is withdrawn and routed to a point of use, wherein the purity of the low vapor pressure stream containing primarily vapor is maintained within a desired range.

22. The apparatus for manufacturing a low vapor pressure stream containing primarily vapor according to claim 21, further comprising:

a supply of high pressure inert gas introduced into the transport vessel through pressurized injection to transfer the liquid phase or two-phase fluid to the vaporization vessel.

23. The apparatus for manufacturing a low vapor pressure stream containing primarily vapor according to claim 21, wherein the delivery panel controls the flow rate, pressure and temperature of the low vapor pressure stream containing primarily vapor delivered to the point of use.

24. The apparatus for manufacturing a low vapor pressure stream containing primarily vapor according to claim 21, wherein the transport vessel is an isotainer.

25. The apparatus for manufacturing a low vapor pressure stream containing primarily vapor according to claim 21, further comprising means for pressurizing the transport vessel.

26. The apparatus for manufacturing a low vapor pressure stream containing primarily vapor according to claim 21, further comprising:

a heater disposed in communication with the vaporization vessel.

27. The apparatus for manufacturing a low vapor pressure stream containing primarily vapor according to claim 21, further comprising:

a further purification unit disposed upstream of the point of use, to further remove contaminants from the low vapor pressure vapor stream.

28. The apparatus for manufacturing a low vapor pressure vapor stream according to claim 27, wherein the purification unit is a partial condensation device.

29. The apparatus for manufacturing a low vapor pressure stream containing primarily vapor according to claim 21, further comprising a waste container where the stream containing primarily liquid withdrawn from the vaporization vessel is directed.

30. The apparatus for manufacturing a low vapor pressure stream containing primarily vapor according to claim 29, further comprising:

a recyling loop returning the stream containing primarily liquid from the waste container to the transport vessel.

31. The apparatus for manufacturing a low vapor pressure stream containing primarily vapor according to claim, 30 further having a scrubber on the recycling loop disposed downstream of the waste container.