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Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load

  • US 20070009146A1
  • Filed: 06/28/2005
  • Published: 01/11/2007
  • Est. Priority Date: 06/28/2005
  • Status: Active Grant
First Claim
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1. A lithography apparatus, comprising:

  • an array of individually controllable elements that modulate a beam of radiation;

    a data processing pipeline that converts a first data representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate, the data processing pipeline comprising, a plurality of data manipulation devices, and a calculation load controller that divides the first data representation into a plurality of data packets, each corresponding to one of a set of sub-regions of the requested dose pattern, and forwards each of the data packets to a respective one of the data manipulation devices, wherein the calculation load controller selects the data packets to forward to each of the data manipulation devices so as to balance a total calculation load between the data manipulation devices.

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