Lithographic apparatus and device manufacturing method utilizing a continuous light beam in combination with pixel grid imaging
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system that supplies a continuous source radiation;
an array of individually controllable elements that modulate the radiation beam;
a substrate mover that continuously moves the substrate in a first direction relative to the radiation beam; and
a projection system that projects the modulated radiation beam onto a target portion of a substrate using, an array of focusing elements arranged in a plane, wherein each focusing element projects a different portion of the patterned radiation beam onto the substrate, each of the different portions forming a sub-beam of radiation, and wherein at a focal point of at least one of the focusing elements in the array of focusing elements a maximum length of a cross-section of a corresponding one of the sub-beams of radiation is shorter in the first direction than in a second direction perpendicular to the first direction.
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Abstract
A continuous source of radiation, for example a lamp, is used in conjunction with pixel grid imaging. In one example, the individually controllable elements operate at a frequency of at least about 50 kHz. To compensate for any distortion of an exposed spot a point spread function is adjusted to be shorter in a scanning direction.
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Citations
15 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that supplies a continuous source radiation;
an array of individually controllable elements that modulate the radiation beam;
a substrate mover that continuously moves the substrate in a first direction relative to the radiation beam; and
a projection system that projects the modulated radiation beam onto a target portion of a substrate using, an array of focusing elements arranged in a plane, wherein each focusing element projects a different portion of the patterned radiation beam onto the substrate, each of the different portions forming a sub-beam of radiation, and wherein at a focal point of at least one of the focusing elements in the array of focusing elements a maximum length of a cross-section of a corresponding one of the sub-beams of radiation is shorter in the first direction than in a second direction perpendicular to the first direction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A device manufacturing method, comprising:
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using an array of individually controllable elements to pattern a continuous beam of radiation;
projecting the patterned beam of radiation onto a target portion of a substrate using at least an array of focusing elements arranged in a plane, such that each focusing element in the array of focusing elements projects a different portion of the patterned radiation beam onto the substrate, each of the different portions forming a sub-beam; and
continuously moving the substrate in a first direction;
wherein the patterned radiation beam is projected such that, at a focal point of at least one of the focusing elements in the array of focusing elements, a maximum length of a cross-section of a corresponding one of the sub-beams of radiation is shorter in the first direction than in a second direction, which is perpendicular to the first direction. - View Dependent Claims (14, 15)
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Specification