Etching method and apparatus

• US 20070019206A1
• Filed: 07/19/2006
• Published: 01/25/2007
• Est. Priority Date: 07/19/2005
• Status: Abandoned Application

• Current Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Original Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Inventors: Ohbuchi, Shuzoh
• Application Number:
  US11/489,783
• Publication Number:
  US 20070019206A1
• Time in Patent Office: Days
• US Class Current: 356/504
• CPC Class Codes: G01B 11/0675 using interferometry
• CPC Class Codes: H01L 22/26 Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement endpoint detection arrangements in CMP apparatus B24B37/013, in discharge apparatus H01J37/32

Abstract

A to-be-etched substrate is illuminated by two lights each having a different wavelength coming from a light source in a light source detector section. The lights are reflected on the to-be-etched substrate. The two reflected lights as a result of reflection on the to-be-etched substrate each include an interfered light, which is generated by the lights reflected on the surface of the layer to be etched, and a boundary between the layers to be etched. A detector in a light source detector section converts the intensity of the received two interfered lights into electric signals for output to a control section. The control section calculates the etching speed from the frequency of either of the two interfered lights whichever having the larger amplitude. Based on thus calculated etching speed and the time taken for the etching operation, the etching depth is calculated.

Claims

1. An etching method for etching a plurality of layers to be etched having a different index of refraction, comprising:

illuminating the layers to be etched by two coherent lights each having a different wavelength;

observing two interfered lights generated by the illuminating two different lights reflected on a boundary between the layers to be etched; and

based on the frequency of either of the two observed interfered lights whichever meeting predetermined requirements, measuring the etching depth.

2. The etching method of claim 1, wherein when the etching depth is measured, the etching speed is calculated from the frequency of the interfered light meeting the predetermined requirements, and based on the calculated etching speed and the time taken for the etching, the etching depth is measured..

3. The etching method of claim 1, wherein of adjacent layers of the plurality of layers to be etched whose boundary has a maximum reflection among those of boundaries of the other adjacent layers of the plurality of layers, a light illumination side layer of the adjacent layers whose boundary has the maximum reflection has an index of refraction lower than that of the other of the adjacent layers to be etched, and at least either of the two different coherent lights has a wavelength λ

not satisfying an equation of L÷

(λ

/n)=N1/4+m,

where L denotes a thickness of the light illumination side layer to be etched, n denotes the index of refraction thereof, m is a natural number, and N1 is 1 or 3.

4. The etching method of claim 1, wherein the two different coherent lights each have a wavelength equivalent to the band gap energy of the layer to be etched, or the wavelength in a close range thereof.

5. The etching method of claim 1, wherein the predetermined requirements are of being either of the observed interfered lights having the larger amplitude.

6. An etching method for etching a plurality of layers to be etched varying in index of refraction, comprising:

illuminating the layers to be etched by coherent lights of the same wavelength coming from two different directions;

observing two interfered lights generated by the illuminating lights coming from the two different directions and being reflected on a boundary between the layers to be etched; and

based on the frequency of either of the two observed interfered lights whichever meeting predetermined requirements, measuring the etching depth.

8. The etching method of claim 6, wherein the predetermined requirements are of being either of the observed interfered lights having the larger amplitude.

7. The etching method of 6 wherein, one of the two different directions is vertical to the surface of the layers to be etched,

of adjacent layers of the plurality of layers to be etched whose boundary has a maximum reflection among those of boundaries of the other adjacent layers of the plurality of layers, a light illumination side layer of the adjacent layers whose boundary has the maximum reflection has an index of refraction lower than that of the other of the adjacent layers to be etched, and in the light illumination side layer, an angle θ

between a direction vertical to a surface of layers to be etched and a second direction being the other of the two different directions does not satisfy an equation of cos θ

=2 nL/(2 nL+λ

N2),

where L denotes a thickness of the light illumination side layer to be etched, n denotes the index of refraction thereof, λ

is the wavelength of the coherent lights, and N2 is an odd natural number.

9. An etching apparatus for etching a plurality of layers to be etched varying in index of refraction, comprising:

a light emission section for emitting two coherent lightseach having a different wavelength;

an optical system for illuminating the layers to be etched by the two different lights emitted from the light emission section;

a detector for receiving two interfered lights generated by the two different lights that illuminate the layers to be etched by the optical system, and that are reflected on a boundary between the layers to be etched; and

a measurement section for measuring the etching depth based on the frequency of either of the two interfered lights received by the detector whichever meeting predetermined requirements.

10. The etching apparatus of claim 9, wherein the light emission section includes a spectrometer for splitting the light into lights of varying wavelengths.

11. The etching apparatus of claim 9, wherein the light emission section includes a light source for emitting a laser light.

12. The etching apparatus of claim 9, further comprising:

a determination section for determining whether the etching depth measured by the measurement section reaches a predetermined etching depth; and

a display section for displaying thereon, when the determination section determines that the etching depth reaches the predetermined etching depth, a message telling that the etching depth reaches the predetermined etching depth.

13. The etching apparatus of claim 9, further comprising:

a determination section for determining whether the etching depth measured by the measurement section reaches a predetermined etching depth; and

a stop section for stopping, when the determination section determines that the etching depth reaches the predetermined etching depth, an etching operation for the layer to be etched.

14. An etching apparatus for etching a plurality of layers to be etched varying in index of refraction, comprising:

a light emission section for emitting coherent lights of the same wavelength;

an optical system for illuminating the layers to be etched by the lights emitted from the light emission section from two different directions;

a detector for receiving two interfered lights generated by the lights from the two different directions that illuminate the layers to be etched by the optical system, and that are reflected on a boundary between the layers to be etched; and

a measurement section for measuring the etching depth based on the frequency of either of the two interfered lights received by the detector whichever meeting predetermined requirements.

15. The etching apparatus of claim 14, wherein the light emission section includes a light source for emitting a laser light.

16. The etching apparatus of claim 14, further comprising:

a determination section for determining whether the etching depth measured by the measurement section reaches a predetermined etching depth; and

a display section for displaying thereon, when the determination section determines that the etching depth reaches the predetermined etching depth, a message telling that the etching depth reaches the predetermined etching depth.

17. The etching apparatus of claim 14, further comprising:

a determination section for determining whether the etching-depth measured by the measurement section reaches a predetermined etching depth; and

a stop section for stopping, when the determination section determines that the etching depth reaches the predetermined etching depth, an etching operation for the layer to be etched.