Functional organic based vapor deposited coatings adhered by an oxide layer
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Abstract
An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and an organic-based layer is directly deposited over the oxide-based layer. Typically, a series of alternating layers of oxide-based layer and organic-based layer are applied.
120 Citations
69 Claims
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1-55. -55. (canceled)
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56. A method of providing a liquid and vapor-resistant organic-based coating on a substrate, comprising:
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a) vapor depositing on said substrate at least one inorganic layer selected from the group consisting of an oxide, a nitride, or a combination thereof, wherein said oxide or nitride is selected from the group consisting of aluminum oxide, aluminum nitride, titanium oxide, titanium nitride, silicon oxide, silicon nitride, and combinations thereof; and
b) subsequently vapor depositing at least one organic layer from an organic-based precursor material which forms a bond with said at least one inorganic layer. - View Dependent Claims (57, 58, 59, 60, 62, 64, 66, 67, 69)
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Specification