System and method for lithography simulation
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Abstract
There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and inter-dependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks.
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Citations
71 Claims
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1-35. -35. (canceled)
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36. A system to simulate a lithographic design comprised of a plurality of polygons arranged in a predetermined configuration, the system comprising:
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a microprocessor subsystem to convert a circuit design database, which is representative of a integrated circuit pattern, to a pixel-based bitmap representation thereof, wherein the pixel-based bitmap includes pixel data; and
an accelerator subsystem, coupled to the microprocessor subsystem, to calculate at least a portion of an aerial image of the lithographic design using the pixel-based bitmap representation of the lithographic design. - View Dependent Claims (37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51)
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52. A system for simulating a lithographic design, the system comprising:
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means for partitioning a database which includes information which is representative of the lithographic design;
means for converting the lithographic design to a pixel-based bitmap representation thereof, wherein the pixel-based bitmap includes pixel data, and wherein each pixel datum represents a pixel having a predetermined pixel size, wherein the lithographic design includes resolution enhancement technology; and
means for calculating a portion of an aerial image of the lithographic design using a corresponding portion of the pixel-based bitmap representation of the lithographic design. - View Dependent Claims (53, 54, 55, 56, 57)
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58. A system to simulate a lithographic design comprised of a plurality of polygons arranged in a predetermined configuration, the system comprising:
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a microprocessor computing system to;
(1) convert the plurality of polygons to a pixel-based bitmap representation thereof, wherein the pixel-based bitmap includes pixel data, and wherein each pixel datum represents a pixel having a predetermined pixel size, (2) calculate at least a portion of an aerial image of the lithographic design using the pixel-based bitmap representation of the lithographic design, and (3) calculate a pattern formed on a wafer by the lithographic design using the pixel-based bitmap representation of the lithographic design and a coefficient matrix representing projection and illumination optics of a photolithographic tool; and
a processing system, coupled to the microprocessor computing system, to determine a printing sensitivity using patterns on the wafer calculated in response to varying coefficients of the matrix representing projection and illumination optics of a photolithographic tool. - View Dependent Claims (59, 60, 61, 62, 63, 64)
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65. A system to simulate a lithographic design comprised of a plurality of polygons arranged in a predetermined configuration, the system comprising:
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a microprocessor computing system to;
(1) convert the plurality of polygons to a pixel-based bitmap representation thereof, wherein the pixel-based bitmap includes pixel data, and wherein each pixel datum represents a pixel having a predetermined pixel size, (2) calculate an aerial image in resist formed on a wafer by the lithographic design using the pixel-based bitmap representation of the lithographic design and a coefficient matrix representing projection and illumination optics of a photolithographic tool, and (3) calculate a pattern formed on a wafer by the lithographic design using the pixel-based bitmap representation of the lithographic design and a coefficient matrix representing projection and illumination optics of a photolithographic tool; and
a processing system, coupled to the microprocessor computing system, to determine a printing sensitivity using patterns on the wafer calculated in response to varying coefficients of the coefficient matrix representing projection and illumination optics of a photolithographic tool. - View Dependent Claims (66, 67, 68, 69, 70, 71)
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Specification