Methods of fabricating silicon carbide crystals
First Claim
1. A method of producing a silicon carbide boule having a substantially single polytype, the method comprising:
- forcing preferential nucleation sites on a surface of a silicon carbide seed crystal having the substantially single polytype to a predefined pattern; and
growing the silicon carbide boule utilizing physical vapor transport (PVT) so as to provide selective preferential growth of silicon carbide on the silicon carbide seed crystal corresponding to the predefined pattern;
wherein forcing preferential nucleation sites comprises forming a pattern on the surface of the seed crystal so as to provide regions of the seed crystal which extend beyond other regions of the seed crystal; and
wherein forming a pattern comprises forming a pattern of sidewalls in the exposed surface of the seed crystal; and
wherein growing the silicon carbide boule comprises preferentially growing silicon carbide from the sidewalls.
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Abstract
Methods for producing silicon carbide crystals, seed crystal holders and seed crystal for use in producing silicon carbide crystals and silicon carbide crystals are provided. Silicon carbide crystals are produced by forcing nucleation sites of a silicon carbide seed crystal to a predefined pattern and growing silicon carbide utilizing physical vapor transport (PVT) so as to provide selective preferential growth of silicon carbide corresponding to the predefined pattern. Seed holders and seed crystals are provided for such methods. Silicon carbide crystals having regions of higher and lower defect density are also provided.
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Citations
4 Claims
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1. A method of producing a silicon carbide boule having a substantially single polytype, the method comprising:
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forcing preferential nucleation sites on a surface of a silicon carbide seed crystal having the substantially single polytype to a predefined pattern; and
growing the silicon carbide boule utilizing physical vapor transport (PVT) so as to provide selective preferential growth of silicon carbide on the silicon carbide seed crystal corresponding to the predefined pattern;
wherein forcing preferential nucleation sites comprises forming a pattern on the surface of the seed crystal so as to provide regions of the seed crystal which extend beyond other regions of the seed crystal; and
wherein forming a pattern comprises forming a pattern of sidewalls in the exposed surface of the seed crystal; and
wherein growing the silicon carbide boule comprises preferentially growing silicon carbide from the sidewalls. - View Dependent Claims (2, 3, 4)
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Specification