UNIQUE PASSIVATION TECHNIQUE FOR A CVD BLOCKER PLATE TO PREVENT PARTICLE FORMATION
First Claim
1. A blocker plate for distributing gases, the blocker plate comprising:
- an upper surface and a lower surface, wherein the upper surface and the lower surface each comprise a material that is at least about 99.5% pure, and wherein the blocker plate defines a plurality of holes therethrough that extend between the upper surface and the lower surface.
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Accused Products
Abstract
Blocker plates for chemical vapor deposition chambers and methods of treating blocker plates are provided. The blocker plates define a plurality of holes therethrough and have an upper surface and a lower surface that are at least about 99.5% pure, which minimizes the nucleation of contaminating particles on the blocker plates. A physically vapor deposited coating, such as an aluminum physically vapor deposited coating, may be formed on the upper and lower surfaces of the blocker plates. Chemical vapor deposition chambers including blocker plates having a physically vapor deposited coating thereon are also provided.
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Citations
24 Claims
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1. A blocker plate for distributing gases, the blocker plate comprising:
an upper surface and a lower surface, wherein the upper surface and the lower surface each comprise a material that is at least about 99.5% pure, and wherein the blocker plate defines a plurality of holes therethrough that extend between the upper surface and the lower surface. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A blocker plate for distributing gases, the blocker plate comprising:
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an upper surface and a lower surface, wherein the blocker plate defines a plurality of holes therethrough that extend between the upper surface and the lower surface; and
an aluminum coating on the upper surface and the lower surface, wherein the aluminum coating is formed by physical vapor depositing or thermally evaporating the aluminum coating on the blocker plate in a processing chamber. - View Dependent Claims (8, 9, 10, 11)
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- 12. A method for treating a blocker plate in a processing chamber, comprising physical vapor depositing an aluminum coating on an upper surface and a lower surface of the blocker plate.
- 17. A chemical vapor deposition chamber comprising a blocker plate, wherein the blocker plate comprises an upper surface and a lower surface, wherein the upper surface and the lower surface each comprise a material that is at least about 99.5% pure, and wherein the blocker plate defines a plurality of holes therethrough that extend between the upper surface and the lower surface.
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21. A method for treating a blocker plate, comprising:
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physical vapor depositing a coating on an upper surface and a lower surface of the blocker plate for a first period of time;
degassing the blocker plate for a period of time; and
thenphysical vapor depositing the coating on the upper surface and the lower surface of the blocker plate for a second period of time. - View Dependent Claims (22, 23, 24)
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Specification