Exposure apparatus and exposure method, and method of manufacturing electrical wiring board

• US 20070024838A1
• Filed: 07/26/2006
• Published: 02/01/2007
• Est. Priority Date: 07/27/2005
• Status: Active Grant

• Current Assignee: Adtec Engineering Company Limited (Ushio Incorporated)
• Original Assignee: Hitachi VIA Mechanics Limited (Hitachi, Ltd.)
• Inventors: Kishi, Masakazu, Yamaguchi, Yoshihide
• Granted Patent: US 7,839,484 B2
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: B33Y 80/00 Products made by additive manufacturing
• CPC Class Codes: G03B 27/54 Lamp housings; Illuminating means
• CPC Class Codes: G03F 7/7005 by multiple sources, e.g. light-emitting diodes [LED] or light source arrays addressable array sources specially adapted to produce patterns without a mask G03F7/70391
• CPC Class Codes: G03F 7/70466 Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature stitching G03F7/70475

Abstract

This invention provides: an exposure apparatus and exposure method based on a maskless exposure technique which uses a two-dimensional optical modulator, in which maskless exposure technique, the exposure apparatus and exposure method employ a first irradiation source optics for drawing a pattern based on exposure pattern data, and a second irradiation source optics for irradiating an energy ray onto a desired area of space on a region inclusive of a region in which the pattern has been drawn; and a method of manufacturing a wiring Substrate (Board); thus, highly accurate pattern forming based on the exposure pattern data is achieved at high throughput and at low costs.

Claims

1. A maskless exposure apparatus comprising:

a first irradiation light source;

a light modulation optics which forms a beam of light by conducting modulation of irradiation light which has been emitted from the first irradiation light source based on exposure pattern data;

an imaging optics which draws an image by converging, on the surface of an object to be exposed to light, the beam formed by the light modulation optics;

a scanning means which scans in a relative fashion the beam used during imaging with the imaging optics, and the surface of the object to be exposed; and

a second irradiation light source which irradiates the surface of the object with an energy ray.

6. The maskless exposure apparatus according to claim 1, wherein:

a centerline of an optical axis of the light emitted from the second irradiation light source is disposed in any region which ranges from an edge of an imaging convergence region of the light emitted from the first irradiation light source, to an edge of the object exposed.

7. The maskless exposure apparatus according to claim 1, wherein:

a centerline of an optical axis of the light emitted from the second irradiation light source is disposed in parallel with respect to an imaging convergence central axis of the light emitted from the first irradiation light source.

8. The maskless exposure apparatus according to claim 1, wherein:

a centerline of an optical axis of the light emitted from the second irradiation light source is disposed so as to cross an imaging convergence central axis of the light emitted from the first irradiation light source on the surface of the object exposed.

2. A maskless exposure apparatus comprising:

a first irradiation light source;

a two-dimensional digital optical modulator which digitally modulates the irradiation light emitted from the first irradiation light source, so as to form a beam of light on the basis of exposure pattern data;

an imaging optics which generates an image by converging the beam of light, formed by the two-dimensional digital optical modulator, on the surface of an object to be exposed to light;

a scanning means which scans in a relative fashion the beam of light, converged by the imaging optics to generate the image, and the surface of the object exposed; and

a second irradiation light source which irradiates the surface of the object with an energy ray.

3. A maskless exposure apparatus comprising:

a beam light source which is a first irradiation light source;

a light modulation optics which modulates the irradiation light emitted from the first irradiation light source, so as to form a beam of light on the basis of exposure pattern data;

an imaging optics which generates an image by converging the beam of light formed by the light modulation optics, on the surface of an object to be exposed to light;

a scanning means which scans in a relative fashion the beam of light converged by the imaging optics to generate the image, and the surface of the object exposed; and

a second irradiation light source which irradiates the surface of the object with an energy ray.

4. A maskless exposure apparatus comprising:

a first irradiation light source which emits the light that contains ultraviolet rays;

a two-dimensional digital optical modulator which digitally modulates the irradiation light emitted from the first irradiation light source, so as to form a beam of light on the basis of desired exposure pattern data;

an imaging optics which generates an image by converging the beam of light, formed by the two-dimensional digital optical modulator, on the surface of an object to be exposed to light;

a scanning means which scans in a relative fashion the beam of light, converged by the imaging optics to generate the image, and the surface of the object exposed; and

a second irradiation light source which irradiates the surface of the object with an energy ray.

5. An exposure apparatus comprising:

a first irradiation light source which emits the light that contains ultraviolet rays;

a photomask holder which holds a photomask having a light-shielding pattern drawn thereon in accordance with exposure pattern data;

an imaging optics which generates an image by converging, after a beam of light has passed through the photomask, the beam of light on the surface of an object to be exposed to light; and

a second irradiation light source which irradiates the surface of the object with an energy ray.

9. An exposure method for processing a photosensitive material by irradiating, with a beam of light that has been processed into a pattern shape, the surface of an object to be exposed to light, and then developing the photosensitive material, the exposure method comprising:

a second exposure step for irradiating with an energy ray the inside of an area of space containing a region irradiated during first exposure.

10. A maskless exposure method for processing a photosensitive material by irradiating, with a beam of light that has been processed into a pattern shape, the surface of an object to be exposed to light, and then developing the photosensitive material, wherein:

a first exposure irradiation step and a second exposure irradiation step are executed at the same time, the first exposure irradiation step being for conducting irradiation with the beam of light that has been processed into the pattern shape, and the second exposure irradiation step being for irradiating with a uniform energy ray the inside of a desired area of space containing a region irradiated in the first exposure irradiation step.

11. An exposure apparatus comprising:

a first exposure irradiation light source optics which conducts irradiation with a beam of light that has been processed into a pattern shape; and

a second exposure irradiation light source optics which irradiates with a uniform energy ray the inside of a desired area of space containing a region irradiated by the first exposure optics.

12. The exposure apparatus according to claim 11, wherein:

the first exposure irradiation light source optics and the second exposure irradiation light source optics are controlled to move in an interactive fashion.

13. An exposure apparatus comprising:

a first irradiation light source;

a light modulation optics which modulates the irradiation light emitted from the first irradiation light source on the basis of desired exposure pattern data;

an imaging optics which generates an image by converging the beam of light formed by the light modulation optics, on the surface of an object to be exposed to light;

a scanning means which scans in a relative fashion the beam of light converged by the imaging optics to generate the image, and the surface of the object exposed;

a second irradiation light source; and

a spectroscopic optics which splits the light emitted from the second irradiation light source into beams each of a different wavelength.

14. The exposure apparatus according to claim 13, wherein:

the spectroscopic optics which splits the light emitted from the second irradiation light source, into the beams each of a different wavelength is disposed so that the beams that have been split the emitted light during passage thereof through the spectroscopic optics, contain a region in which the beam of light of a desired shape is converged to generate the image on the surface of the object by passing through the light modulation optics and the imaging optics the irradiation light emitted from the first irradiation light source.

15. An exposure apparatus comprising:

a first irradiation light source;

a light modulation optics which modulates the irradiation light emitted from the first irradiation light source in the basis of exposure pattern data;

an imaging optics which generates an image by converging the beam of light formed by the light modulation optics, on the surface of an object to be exposed to light;

a scanning means which scans in a relative fashion the beam of light converged by the imaging optics to generate the image, and the surface of the object exposed; and

a second irradiation light source with wavelength selection means.

16. A manufacturing method for a wiring Substrate (Board), comprising the steps of:

coating a photosensitive material in a film form on the Substrate (Board);

forming a resist pattern by developing the photosensitive material after inducing a photochemical reaction in the photosensitive material; and

processing a conductor by using the resist pattern;

wherein the step of inducing the photochemical reaction of the photosensitive material is split into;

a first exposure irradiation stage for inducing a photochemical reaction only in a desired section by irradiating the desired section with a processed beam of light; and

a second exposure stage for inducing another photochemical reaction in a region inclusive of a neighboring section of a region which is irradiated during the first exposure irradiation stage, by conducting irradiation with a uniform energy ray such that the energy ray will include at least the region irradiated during the first exposure irradiation stage.