Operating method for a large dimension plasma enhanced atomic layer deposition cavity and an apparatus thereof

• US 20070026162A1
• Filed: 10/06/2005
• Published: 02/01/2007
• Est. Priority Date: 07/29/2005
• Status: Active Grant

• Current Assignee: China Star Optoelectronics International (HK) Limited (TCL Technology Group Corp.)
• Original Assignee: China Star Optoelectronics International (HK) Limited (TCL Technology Group Corp.)
• Inventors: Ting, Hung-Che, Wei, Hung-Wen
• Granted Patent: US 8,097,083 B2
• Time in Patent Office: Days
• US Class Current: 427/569
• CPC Class Codes: C23C 16/4412 Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
• CPC Class Codes: C23C 16/45527 characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
• CPC Class Codes: C23C 16/45544 characterized by the apparatus
• CPC Class Codes: C23C 16/45557 Pulsed pressure or control pressure
• CPC Class Codes: C23C 16/509 using internal electrodes
• CPC Class Codes: C23C 16/52 Controlling or regulating the coating process C23C16/45557, C23C16/279 take precedence
• CPC Class Codes: H05H 1/24 Generating plasma nuclear fusion reactors G21B1/00; gas-filled discharge reactors H01J37/32

Abstract

An operating method for a large dimension plasma enhanced atomic layer deposition cavity and an apparatus thereof are provided. The present invention reduces the time needed for filling the manufacturing gas into the large volume manufacturing cavity. Therefore, the plasma enhanced atomic layer deposition apparatus can switch the precursors rapidly to increase the thin film deposition rate, reduce the manufacturing gas consumption and lower the manufacturing cost.

Claims

1. An operating method for a large dimension plasma enhanced atomic layer deposition cavity, comprising:

inputting a pneumatic valve frequency signal to make a purifying gas enter into the large dimension plasma enhanced atomic layer deposition cavity;

outputting a pressure signal to a rotatable throttle valve controller to generate a valve position signal and a rotating frequency signal;

closing the rotatable throttle valve and filling a first gas into the large dimension plasma enhanced atomic layer deposition cavity;

inputting a pneumatic valve frequency signal to make a purifying gas enter into the large dimension plasma enhanced atomic layer deposition cavity;

outputting a pressure signal to a rotatable throttle valve controller to generate a valve position signal and a rotating frequency signal; and

closing the rotatable throttle valve and filling a second gas into the large dimension plasma enhanced atomic layer deposition cavity.

2. The operating method for a large dimension plasma enhanced atomic layer deposition cavity as claimed in claim 1, wherein the step of outputting a pressure signal to a rotatable throttle valve controller opens a rotating throttle valve to exhaust the purifying gas from the large dimension plasma enhanced atomic layer deposition cavity via the valve position signal and the rotating frequency signal.

3. The operating method for a large dimension plasma enhanced atomic layer deposition cavity as claimed in claim 1, wherein the step of closing the rotatable throttle valve and filling a second gas further comprises:

inputting a pneumatic valve frequency signal to make a purifying gas enter into the large dimension plasma enhanced atomic layer deposition cavity; and

outputting a pressure signal to a rotatable throttle valve controller to generate a valve position signal and a rotating frequency signal, the rotatable throttle valve is opened via the valve position signal and a rotating frequency signal to exhaust the purifying gas from the large dimension plasma enhanced atomic layer deposition cavity.

4. The operating method for a large dimension plasma enhanced atomic layer deposition cavity as claimed in claim 1, wherein the pneumatic valve frequency signal is generated by a signal generator.

5. The operating method for a large dimension plasma enhanced atomic layer deposition cavity as claimed in claim 1, wherein the valve position signal and the rotating frequency signal are generated by a signal generator.

6. The operating method for a large dimension plasma enhanced atomic layer deposition cavity as claimed in claim 1, wherein the pressure signal is sensed by a sensor.

7. An apparatus of a large dimension plasma enhanced atomic layer deposition cavity, comprising:

a large dimension plasma enhanced atomic layer deposition cavity, defining a reaction space;

a first gas supply source, connected to one side of the large dimension plasma enhanced atomic layer deposition cavity for providing a first gas;

a second gas supply source, connected to one side of the large dimension plasma enhanced atomic layer deposition cavity for providing a second gas;

a purifying gas supply source, connected to one side of the large dimension plasma enhanced atomic layer deposition cavity for providing a purifying gas; and

a sensor, installed at one side of the large dimension plasma enhanced atomic layer deposition cavity and interlinked with the reaction space for sensing the pressure in the reaction space.

8. The apparatus of a large dimension plasma enhanced atomic layer deposition cavity as claimed in claim 7, further comprising:

a rotatable throttle valve, installed at one side of the large dimension plasma enhanced atomic layer deposition cavity and interlinked with the reaction space;

a rotatable throttle valve controller, receiving a pressure signal outputted from the sensor to generate a valve position signal and a rotating frequency signal to control the rotatable throttle valve;

a rotating disk throttle valve, installed at one side of the large dimension plasma enhanced atomic layer deposition cavity and interlinked with the reaction space; and

a rotating disk throttle valve controller, receiving a pressure signal outputted from the sensor to generate an adjusting pressure valve position signal to control the pressure in the transmitting gas pipe and a rotating frequency signal to control the rotatable throttle valve.

9. The apparatus of a large dimension plasma enhanced atomic layer deposition cavity as claimed in claim 8, wherein the rotatable throttle valve and the rotating disk throttle valve are used for controlling and exhausting the first gas, the second gas and the purifying gas in the reaction space.

10. The apparatus of a large dimension plasma enhanced atomic layer deposition cavity as claimed in claim 8, wherein the pressure signal is sensed by a sensor.

11. The apparatus of a large dimension plasma enhanced atomic layer deposition cavity as claimed in claim 8, wherein the pneumatic valve frequency signal is generated by a signal generator.

12. The apparatus of a large dimension plasma enhanced atomic layer deposition cavity as claimed in claim 8, wherein the valve position signal, the adjusting pressure valve position signal and the rotating frequency signal are generated by a signal generator.

13. A large dimension plasma enhanced atomic layer deposition cavity used for filling gas quickly, comprising:

an upper electrode plate and a lower electrode plate;

at least one gas pipe, installed above the upper electrode plate;

at least one fast gas valve, installed above the gas pipe;

as least one insulation material, installed under the gas pipe, above the upper electrode plate and around the lower electrode plate, used for insulating; and

a RF power supply, connected with one side of the upper electrode plate.

14. The large dimension plasma enhanced atomic layer deposition cavity used for filling gas quickly as claimed in claim 13, wherein the lower electrode plate is grounded.

15. The large dimension plasma enhanced atomic layer deposition cavity used for filling gas quickly as claimed in claim 13, wherein the lower electrode plate has a plurality of small holes used for emitting nitrogen or another inert gas to transport a substrate by a floating force.