Lithographic apparatus and device manufacturing method
First Claim
1. A lithography apparatus, comprising:
- a patterning device configured to pattern a beam of radiation;
a projection system configured to project the patterned beam onto a target area of a substrate; and
a data manipulation device configured to convert data representing a pattern to a control signal through applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the pattern, the point-spread function matrix including information about a shape and relative position of the point-spread function of spots to be exposed on the substrate by the beam of radiation, whereby the control signal is configured to be used to control the patterning device to pattern the beam.
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Abstract
A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus also includes a data-path including at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each spot to be exposed on the substrate by one of the sub-beams of radiation at a given time.
29 Citations
19 Claims
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1. A lithography apparatus, comprising:
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a patterning device configured to pattern a beam of radiation;
a projection system configured to project the patterned beam onto a target area of a substrate; and
a data manipulation device configured to convert data representing a pattern to a control signal through applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the pattern, the point-spread function matrix including information about a shape and relative position of the point-spread function of spots to be exposed on the substrate by the beam of radiation, whereby the control signal is configured to be used to control the patterning device to pattern the beam. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A device manufacturing method, comprising:
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converting data representing a pattern to a control signal through applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the pattern, the point-spread function matrix including information about a shape and relative position of the point-spread function of spots to be exposed on a substrate by a beam of radiation;
patterning the beam of radiation based on the control signal; and
projecting the patterned beam onto a target position of the substrate. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification