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Lithographic apparatus and device manufacturing method using dose control

  • US 20070030471A1
  • Filed: 10/13/2006
  • Published: 02/08/2007
  • Est. Priority Date: 06/08/2004
  • Status: Abandoned Application
First Claim
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1. A device manufacturing method, comprising:

  • (a) patterning a beam of radiation with a patterning device to form a plurality of pixels;

    (b) projecting the patterned beam onto a target portion of a substrate;

    (c) controlling the patterning device, such that each pixel in the plurality of pixels delivers a first radiation dose to the target portion that is below or equal to a first value; and

    (d) controlling the patterning device, such that at least one selected pixel in the plurality of pixels delivers a second radiation dose to the target that is greater than the first value to compensate at least partially for;

    (1) an effect of a defective area in the patterning device on a pixel in the plurality of pixels adjacent the selected pixel, or (2) an underexposure of the target portion at a location corresponding to the selected pixel resulting from exposure of the location to a pixel in the plurality of pixels affected by a known defective area of the patterning device.

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