Method and apparatus for processing semiconductor work pieces
First Claim
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1. A processing apparatus for semiconductor work pieces, comprising:
- a processing chamber having an internal cavity and which has a plurality of rotatable processing stations within the internal cavity, and which are each operable to process a semiconductor work piece.
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Abstract
A processing apparatus for semiconductor work pieces and related methodology is disclosed and which includes a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations positioned therein and wherein the rotatable processing stations each process a semiconductor work piece.
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Citations
48 Claims
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1. A processing apparatus for semiconductor work pieces, comprising:
a processing chamber having an internal cavity and which has a plurality of rotatable processing stations within the internal cavity, and which are each operable to process a semiconductor work piece. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A processing apparatus for semiconductor work pieces, comprises:
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a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations within the internal cavity, and which are each operable to process a semiconductor work piece;
a platform rotation mechanism individually cooperating with each of the rotatable processing stations, and positioned below each of the processing stations, and wherein the platform rotation mechanism rotates and heats the respective processing stations, and wherein the respective processing stations each defines a passageway which extends therethrough, and which will accommodate a plurality of electrical signal inputs; and
a sealing member mounted on the processing station and sealably engaging the processing chamber, and which facilitates the formation of an airtight environment within the internal cavity of the processing chamber. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36)
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37. A processing apparatus for semiconductor work pieces, comprising:
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a processing chamber having an internal cavity and which has a plurality of rotatable processing stations within the internal cavity, and which are each operable to process a semiconductor work piece, and wherein each of the plurality of rotatable processing stations can move upwardly, downwardly and/or rotate relative to the processing chamber;
sealing assemblies mounted on the processing chamber and which maintain the internal cavity of the processing chamber substantially sealed while the rotatable processing stations move upwardly, downwardly, and rotate; and
a cooling apparatus for cooling the sealing assemblies to facilitate the proper operation of the sealing assemblies. - View Dependent Claims (38, 39, 40, 41, 42, 43, 44, 45)
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46. A method for processing semiconductor work pieces, comprising:
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providing a processing chamber having an internal cavity;
providing a plurality of processing stations within the internal cavity of the processing chamber;
positioning individual semiconductor work pieces on each of the individual processing stations; and
rotating and heating the individual processing stations so as to facilitate the effective processing of the semiconductor work pieces within the internal cavity of the processing chamber. - View Dependent Claims (47)
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48. A processing apparatus for semiconductor work pieces, comprising:
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a chamber defining an internal cavity;
a plurality of rotatable and heated processing stations received in the internal cavity, and which are each operable to process a semiconductor work piece; and
wherein at least two of the processing stations rotate in a substantially synchronous fashion so as to facilitate the substantially uniform processing of the semiconductor work pieces; and
a motor drivingly coupled to the at least two of the rotatable and heated processing stations, and which facilitates the synchronous rotation of the at least two processing stations.
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Specification