Solid-state imaging device and method for producing the same
First Claim
1. A solid-state imaging device comprising:
- a semiconductor substrate;
a photoelectric conversion section;
a gate oxide film comprising a two-layer film containing a silicon oxide film and a metal oxide thin film;
a charge transfer section comprising a charge transfer electrode for transferring an electric charge generated in the photoelectric conversion section, the charge transfer electrode comprising;
a first electrode comprising a first conductive film; and
a second electrode comprising a second conductive film, the first electrode and the second electrode being disposed on a surface of the semiconductor substrate through the gate oxide film and alternatively arranged; and
an interelectrode insulating film comprising a sidewall insulating film covering the lateral wall of the first electrode, the interelectrode insulating film separating and insulating the first electrode from the second electrode.
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Accused Products
Abstract
In the solid-state imaging device of the present invention having a photoelectric conversion section and a charge transfer section equipped with a charge transfer electrode for transferring an electric charge generated in the photoelectric conversion section, the charge transfer electrode has an alternate arrangement of a first layer electrode comprising a first layer electrically conducting film and a second layer electrode comprising a second layer electrically conducting film, which are formed on a gate oxide film comprising a laminate film consisting of a silicon oxide film and a metal oxide thin film, and the first layer electrode and the second layer electrode are separated by insulation with an interelectrode insulating film comprising a sidewall insulating film formed by a CVD process to cover the lateral wall of the first layer electrode.
55 Citations
11 Claims
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1. A solid-state imaging device comprising:
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a semiconductor substrate;
a photoelectric conversion section;
a gate oxide film comprising a two-layer film containing a silicon oxide film and a metal oxide thin film;
a charge transfer section comprising a charge transfer electrode for transferring an electric charge generated in the photoelectric conversion section, the charge transfer electrode comprising;
a first electrode comprising a first conductive film; and
a second electrode comprising a second conductive film, the first electrode and the second electrode being disposed on a surface of the semiconductor substrate through the gate oxide film and alternatively arranged; and
an interelectrode insulating film comprising a sidewall insulating film covering the lateral wall of the first electrode, the interelectrode insulating film separating and insulating the first electrode from the second electrode. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method for producing a solid-state imaging device, the solid-state imaging device containing:
- a photoelectric conversion section; and
a charge transfer section having a charge transfer electrode for transferring an electric charge generated in the photoelectric conversion section, comprising;
sequentially laminating a silicon oxide film and a metal oxide thin film on a semiconductor substrate;
forming a first electrode comprising a first conductive film;
forming a silicon oxide film on the top of the first electrode;
anisotropically etching the silicon oxide film by using the metal oxide thin film as an etching stopper to form a sidewall insulating film on the lateral wall of the first electrode; and
forming a second electrode comprising a second conductive film through the sidewall insulating film so as to be insulated and separated from the first electrode. - View Dependent Claims (8, 9, 10, 11)
- a photoelectric conversion section; and
Specification