Liquid crystal display device and method for manufacturing the same
First Claim
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1. A liquid crystal display device comprising:
- a first semiconductor film formed over a gate electrode and a gate line with a gate insulating film interposed therebetween;
a first insulator and a second insulator that are formed over the first semiconductor film;
a source region and a drain region that are separately formed over the first semiconductor film so as not to overlap the first insulator and the second insulator;
a second semiconductor film formed over the first semiconductor film;
a third semiconductor film formed over the first insulator and the second insulator;
a source electrode and a drain electrode that are formed over the source region and the drain region;
a first light shielding film formed over the first insulator with the third semiconductor film interposed therebetween;
a source line formed over the second insulator with the third semiconductor film interposed therebetween; and
a second light shielding film formed over the second semiconductor film, wherein the first insulator is formed between the source region and the drain region;
wherein the second semiconductor film is formed in contact with a part of the second insulator;
wherein the source region, the drain region, the second semiconductor film, and the third semiconductor film are formed of the same conductive material; and
wherein the source electrode, the drain electrode, the source line, the first light shielding film, and the second light shielding film are formed of the same light shielding conductive film.
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Accused Products
Abstract
To provide a liquid crystal display device with high visibility by forming a light shielding film without requiring additional steps. The liquid crystal display device of the invention has a structure in which liquid crystal is injected and sealed between an active matrix substrate over which a pixel portion including a plurality of TFTs, wires, first electrodes (pixel electrodes) and the like are formed and a counter substrate over which a second electrode (counter electrode), a colored film and the like are formed. A part of a conductive film forming electrodes of the TFTs, the wires and the like formed over the active matrix substrate functions as a light shielding film in the pixel portion.
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Citations
27 Claims
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1. A liquid crystal display device comprising:
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a first semiconductor film formed over a gate electrode and a gate line with a gate insulating film interposed therebetween;
a first insulator and a second insulator that are formed over the first semiconductor film;
a source region and a drain region that are separately formed over the first semiconductor film so as not to overlap the first insulator and the second insulator;
a second semiconductor film formed over the first semiconductor film;
a third semiconductor film formed over the first insulator and the second insulator;
a source electrode and a drain electrode that are formed over the source region and the drain region;
a first light shielding film formed over the first insulator with the third semiconductor film interposed therebetween;
a source line formed over the second insulator with the third semiconductor film interposed therebetween; and
a second light shielding film formed over the second semiconductor film, wherein the first insulator is formed between the source region and the drain region;
wherein the second semiconductor film is formed in contact with a part of the second insulator;
wherein the source region, the drain region, the second semiconductor film, and the third semiconductor film are formed of the same conductive material; and
wherein the source electrode, the drain electrode, the source line, the first light shielding film, and the second light shielding film are formed of the same light shielding conductive film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for manufacturing a liquid crystal display device, comprising:
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forming a gate insulating film over a gate electrode obtained from a first conductive film and a gate line;
forming a first semiconductor film over the gate insulating film;
forming a first insulator and a second insulator over a part of the first semiconductor film;
forming a second semiconductor film over the first semiconductor film, the first insulator, and the second insulator to separately form a source region and a drain region so as not to overlap the first insulator and the second insulator; and
forming a light shielding second conductive film over the second semiconductor film to separately form a source electrode over the source region, a drain electrode over the drain region, a first light shielding film over the first insulator, a source line over the second insulator, and a second light shielding film so as not to overlap the first insulator and the second insulator. - View Dependent Claims (11, 12)
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13. A method for manufacturing a liquid crystal display device, comprising:
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forming a gate insulating film over a gate electrode obtained from a first conductive film and a gate line;
forming a first semiconductor film over the gate insulating film;
forming a first insulator and a second insulator over a part of the first semiconductor film;
forming a second semiconductor film over the first semiconductor film, the first insulator, and the second insulator to separately form a source region and a drain region so as not to overlap the first insulator and the second insulator; and
forming a light shielding second conductive film over the second semiconductor film to separately form a source electrode over the source region, a drain electrode over the drain region, a first light shielding film over the first insulator, a source line over the second insulator, and a second light shielding film so as not to overlap the first insulator and the second insulator, wherein an electrode that is electrically connected to the drain electrode and a connecting wire that electrically connects the source line to the source electrode are formed at the same time of the same conductive film. - View Dependent Claims (14, 15)
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16. A method for manufacturing a liquid crystal display device, comprising:
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forming a gate insulating film over a gate electrode obtained from a first conductive film and a gate line;
forming a first semiconductor film over the gate insulating film;
forming a first insulator and a second insulator over a part of the first semiconductor film;
forming a second semiconductor film over the first semiconductor film, the first insulator, and the second insulator to separately form a source region and a drain region so as not to overlap the first insulator and the second insulator; and
forming a light shielding second conductive film over the second semiconductor film to separately form a source electrode over the source region, a drain electrode over the drain region, a first light shielding film over the first insulator, a source line over the second insulator, and a second light shielding film so as not to overlap the first insulator and the second insulator, wherein an electrode that is electrically connected to the drain electrode is formed so as to overlap a part of the second light shielding film. - View Dependent Claims (17, 18)
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19. A liquid crystal display device comprising:
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a semiconductor film formed over a gate electrode and a gate line with a gate insulating film interposed therebetween;
an insulator formed over the semiconductor film;
a source region and a drain region that are separately formed over the semiconductor film so as not to overlap the insulator;
a source electrode and a drain electrode that are formed over the source region and the drain region;
a light shielding film formed over the insulator; and
a protective film formed over the light shielding film, the source electrode, and the drain electrode, wherein the insulator is formed between the source region and the drain region, and wherein the protective film is formed in contact with both side faces of the insulator. - View Dependent Claims (20, 21, 22)
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23. A liquid crystal display device comprising:
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a semiconductor film formed over a gate electrode and a gate line with a gate insulating film interposed therebetween;
a first insulator and a second insulator that are formed over the semiconductor film;
a source region and a drain region that are separately formed over the semiconductor film so as not to overlap the first insulator and the second insulator;
a source electrode and a drain electrode that are formed over the source region and the drain region;
a light shielding film formed over the first insulator;
a source line formed over the second insulator; and
a protective film formed over the light shielding film, the source electrode, and the drain electrode, wherein the first insulator is formed between the source region and the drain region, wherein the protective film is formed in contact with both side faces of the first insulator. - View Dependent Claims (24, 25, 26, 27)
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Specification
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Current AssigneeSemiconductor Energy Laboratory Co., Ltd.
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Original AssigneeSemiconductor Energy Laboratory Co., Ltd.
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InventorsHosoya, Kunio
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Granted Patent
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Time in Patent OfficeDays
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Field of Search
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US Class Current349/43
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CPC Class CodesG02F 1/133512 Light shielding layers, e.g...G02F 1/133604 with lampsG02F 1/133605 including specially adapted...G02F 1/13452 Conductors connecting drive...G02F 1/13606 having means for reducing p...G02F 1/136231 for reducing the number of ...
