ONSITE CHEMISTRY AIR FILTRATION SYSTEM

• US 20070041882A1
• Filed: 08/17/2006
• Published: 02/22/2007
• Est. Priority Date: 08/17/2005
• Status: Active Grant

• Current Assignee: Jeffrey L. Roseberry
• Original Assignee: Jeffrey Roseberry, Robert Darling
• Inventors: Roseberry, Jeffrey, Darling, Robert
• Granted Patent: US 7,651,555 B2
• Time in Patent Office: Days
• US Class Current: 422/186.300
• CPC Class Codes: A61L 9/205 using a photocatalyst or photosensitiser
• CPC Class Codes: B01D 2253/102 Carbon
• CPC Class Codes: B01D 2253/104 Alumina
• CPC Class Codes: B01D 2255/20707 Titanium
• CPC Class Codes: B01D 2255/2073 Manganese
• CPC Class Codes: B01D 2255/802 Photocatalytic
• CPC Class Codes: B01D 2257/302 Sulfur oxides
• CPC Class Codes: B01D 2257/304 Hydrogen sulfide
• CPC Class Codes: B01D 2257/404 Nitrogen oxides other than dinitrogen oxide
• CPC Class Codes: B01D 2257/406 Ammonia
• CPC Class Codes: B01D 2257/7022 Aliphatic hydrocarbons
• CPC Class Codes: B01D 2257/7027 Aromatic hydrocarbons
• CPC Class Codes: B01D 2257/708 Volatile organic compounds V.O.C.'s
• CPC Class Codes: B01D 2257/91 Bacteria; Microorganisms
• CPC Class Codes: B01D 2259/4508 for cleaning air in buildings
• CPC Class Codes: B01D 2259/4566 for use in transportation means
• CPC Class Codes: B01D 2259/4575 in aeroplanes or space ships
• CPC Class Codes: B01D 2259/804 UV light
• CPC Class Codes: B01D 46/0036 by adsorption or absorption
• CPC Class Codes: B01D 53/0407 Constructional details of adsorbing systems
• CPC Class Codes: B01D 53/8609 : Sulfur oxides
• CPC Class Codes: B01D 53/8612 : Hydrogen sulfide
• CPC Class Codes: B01D 53/8625 : Nitrogen oxides
• CPC Class Codes: B01D 53/8634 : Ammonia
• CPC Class Codes: B01D 53/8668 : Removing organic compounds not provided for in B01D53/8603 - B01D53/8665
• CPC Class Codes: B01D 53/8671 : Removing components of defined structure not provided for in B01D53/8603 - B01D53/8668

Abstract

An onsite chemistry air filtration system to remove gaseous contaminants from air is disclosed. The onsite chemistry air filtration system of the present invention comprises: a conventional particulate filtration section, a photochemical filtration section, a static gas phase filtration section and a catalytic filtration section. The conventional particulate filtration section captures solids and condensables. In the photochemical filtration section, UV lamps generate bio-destruction and surface photochemical activity on a semiconductor catalyst material, provide a radiation source to irradiate airborne contaminant molecules and to energize their states to promote reactions and generate airborne ozone and radicals. In the static gas phase filtration section, gas phase filtration media is used to capture contaminants, concentrate them in a relatively confined space and allow airborne generated chemistries to concentrate and react in-situ, thereby creating a regeneration effect on the media. In the catalytic filtration section, catalytic media scavenges and converts airborne radicals and ozone to harmless by-products.

Claims

1. An onsite chemistry air filtration system comprising:

a photochemical filtration section; and

a static gas phase filtration section.

2. The onsite chemistry air filtration system of claim 1 wherein the photochemical filtration section comprises an ozone and radical generation source.

3. The onsite chemistry air filtration system of claim 1 wherein the photochemical filtration section comprises at least one ultraviolet lamp.

4. The onsite chemistry air filtration system of claim 1 wherein the photochemical filtration section comprises a photocatalytic material.

5. The onsite chemistry air filtration system of claim 1 wherein the photochemical filtration section comprises at least one ultraviolet lamp and a photocatalytic material.

6. The onsite chemistry air filtration system of claim 5 wherein the at least one ultraviolet lamp generates light within a frequency range of about 85 nm to about 300 nm.

7. The onsite chemistry air filtration system of claim 6 wherein the at least one ultraviolet lamp generates light at a frequency of about 254 nm.

8. The onsite chemistry air filtration system of claim 6 wherein the at least one ultraviolet lamp generates light at a frequency of about 185 nm.

9. The onsite chemistry air filtration system of claim 6 wherein the at least one ultraviolet lamp generates light at the frequencies of about 185 nm and 254 nm.

10. The onsite chemistry air filtration system of claim 5 wherein the photocatalytic material is titanium dioxide.

11. The onsite chemistry air filtration system of claim 10 wherein the photocatalytic material is coated on a substrate.

12. The onsite chemistry air filtration system of claim 11 wherein the substrate comprises tubular perforated steel.

13. The onsite chemistry air filtration system of claim 5 wherein the at least one ultraviolet lamp and the photocatalytic material are disposed transverse to a direction of airflow through the system.

15. The onsite chemistry air filtration system of claim 1 wherein the static gas phase filtration section comprises at least one media bed

16. The onsite chemistry air filtration system of claim 1 wherein the static gas phase filtration section comprises a first stage filtration section and a second stage filtration section.

17. The onsite chemistry air filtration system of claim 16 wherein the first stage filtration section comprises a media bed of activated carbon.

18. The onsite chemistry air filtration system of claim 16 wherein the second stage filtration section comprises a media bed of activated alumina impregnated with potassium permanganate.

19. The onsite chemistry air filtration system of claim 1 further comprising a conventional particulate filtration section.

20. The onsite chemistry air filtration system of claim 19 wherein the conventional particulate filtration section comprises at least one particle filter.

21. The onsite chemistry air filtration system of claim 1 further comprising a catalytic filtration section configured to convert ozone and scavenge radicals.

22. The onsite chemistry air filtration system of claim 21 wherein the catalytic filtration section comprises a non-woven fiber filter.

23. The onsite chemistry air filtration system of claim 22 wherein the non-woven fiber filter comprises a manganese dioxide catalyst disposed in the filter.

37. The onsite chemistry air filtration system of claim 5 wherein the at least one ultraviolet lamp and the photocatalytic material are disposed parallel to a direction of airflow through the system.

38. The onsite chemistry air filtration system of claim 1 wherein the photochemical filtration section comprises an electrostatically charged surface and at least one ultraviolet lamp generating light within a frequency range of about 85 nm to about 300 nm.

41. The onsite chemistry air filtration system of claim 4 wherein the photocatalytic material is electrostatically charged.

42. The onsite chemistry air filtration system of claim 5 wherein the photocatalytic material is electrostatically charged.

24. An onsite chemistry air filtration system comprising:

a conventional particulate filtration section;

a photochemical filtration section;

a static gas phase filtration section; and

a catalytic filtration section;

wherein the conventional particulate filtration section comprises at least one particle filter,

wherein the photochemical filtration section comprises a source of ultraviolet radiation and a photocatalytic material;

wherein the static gas phase filtration section comprises a first stage filtration section have a first stage media bed and a second stage filtration section having a second stage media bed; and

wherein the catalytic filtration section comprises a catalytic particulate filter.

25. The onsite chemistry air filtration system of claim 24 further comprising a humidity monitor.

26. The onsite chemistry air filtration system of claim 24 further comprising a media bed temperature monitor.

27. The onsite chemistry air filtration system of claim 24 further comprising an ozone sensor.

28. The onsite chemistry air filtration system of claim 24 further comprising an air monitor.

29. The onsite chemistry air filtration system of claim 24 further comprising an external ozone and radical generation device.

30. The onsite chemistry air filtration system of claim 24 further comprising a main control unit.

31. The onsite chemistry air filtration system of claim 24 further comprising a fan.

32. The onsite chemistry air filtration system of claim 24 wherein the first stage media bed comprises activated carbon.

33. The onsite chemistry air filtration system of claim 24 wherein the second stage media bed comprises activated alumina impregnated with potassium permanganate.

34. The onsite chemistry air filtration system of claim 24 wherein the source of ultraviolet radiation comprises at least one ultraviolet lamp generating light within a frequency range of about 85 nm to about 300 nm.

35. The onsite chemistry air filtration system of claim 33 wherein the at least one ultraviolet lamp generates light at the frequencies of about 185 nm and about 254 nm.

36. The onsite chemistry air filtration system of claim 24 wherein the photocatalytic material is titanium dioxide.

39. The onsite chemistry air filtration system of claim 24 wherein the photochemical filtration section further comprises an electrostatically charged surface.

40. The onsite chemistry air filtration system of claim 24 wherein the photocatalytic material is electrostatically charged.

43. The onsite chemistry air filtration system of claim 3 wherein the photochemical filtration section further comprises an electrostatically charged surface.

43-45. -45. (canceled)