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MEMS devices having support structures with substantially vertical sidewalls and methods for fabricating the same

  • US 20070042524A1
  • Filed: 08/18/2006
  • Published: 02/22/2007
  • Est. Priority Date: 08/19/2005
  • Status: Active Grant
First Claim
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1. A method of fabricating a MEMS device, comprising:

  • providing a substrate;

    depositing an electrode layer over the substrate;

    depositing a sacrificial layer over the electrode layer;

    patterning the sacrificial layer to form an aperture;

    depositing a layer of inorganic self-planarizing material over the sacrificial layer, such that it fills the aperture;

    etching back the layer of self-planarizing material to a level at or below the upper surface of the sacrificial layer to form a support structure; and

    depositing a movable layer over the support structure.

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