Body-contacted semiconductor structures and methods of fabricating such body-contacted semiconductor structures
First Claim
1. A semiconductor structure comprising:
- a semiconductor wafer including a semiconductor substrate, a semiconductor layer including a plurality of semiconductor bodies, and a buried dielectric layer separating said semiconductor substrate from said semiconductor body;
a plurality of memory cells built in an array on said semiconductor wafer, each of said memory cells including a storage capacitor and an access device, and said access device including a vertical channel defined in one of the semiconductor bodies and a gate configured to switch current flow through said vertical channel to said storage capacitor; and
a body contact in said buried dielectric layer, said body contact adapted to electrically couple one of said semiconductor bodies with said semiconductor substrate.
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Abstract
A semiconductor structure for a dynamic random access memory (DRAM) cell array that includes a plurality of vertical memory cells built on a semiconductor-on-insulator (SOI) wafer and a body contact in the buried dielectric layer of the SOI wafer. The body contact electrically couples a semiconductor body with a channel region of the access device of one vertical memory cell and a semiconductor substrate of the SOI wafer. The body contact provides a current leakage path that reduces the impact of floating body effects upon the vertical memory cell. The body contact may be formed by an ion implantation process that modifies the stoichiometry of a region of the buried dielectric layer so that the modified region becomes electrically conductive with a relatively high resistance.
97 Citations
19 Claims
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1. A semiconductor structure comprising:
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a semiconductor wafer including a semiconductor substrate, a semiconductor layer including a plurality of semiconductor bodies, and a buried dielectric layer separating said semiconductor substrate from said semiconductor body;
a plurality of memory cells built in an array on said semiconductor wafer, each of said memory cells including a storage capacitor and an access device, and said access device including a vertical channel defined in one of the semiconductor bodies and a gate configured to switch current flow through said vertical channel to said storage capacitor; and
a body contact in said buried dielectric layer, said body contact adapted to electrically couple one of said semiconductor bodies with said semiconductor substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for forming a semiconductor structure in a semiconductor wafer including a semiconductor substrate, a semiconductor layer including a plurality of semiconductor bodies, and a buried dielectric layer separating the semiconductor substrate from the semiconductor layer, the method comprising:
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forming a plurality of trenches in the semiconductor wafer;
building a plurality of vertical memory cells each in a corresponding one of the trenches; and
forming a body contact that extends substantially through the buried dielectric layer and electrically couples one of the semiconductor bodies with the semiconductor substrate. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification