Lithographic apparatus and device manufacturing method that compensates for reticle induced CDU
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system that conditions a radiation beam;
a patterning device that modulates the radiation beam;
a projection system that projects the modulated radiation beam onto a target portion of a substrate; and
a radiation beam inspection device that inspects at least a part of the modulated radiation beam;
wherein in a substrate exposing configuration, the lithographic apparatus exposes a pattern of radiation on the substrate using the modulated radiation beam, and wherein in a radiation beam inspecting configuration, the radiation beam inspection device inspects the pattern of radiation that would be exposed on the substrate if the lithographic apparatus was in the substrate exposing configuration.
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Abstract
A lithographic apparatus operable in a substrate exposing configuration to expose a substrate with a pattern of radiation and a radiation beam inspection configuration in which the pattern of radiation that would be exposed on the substrate if the lithographic apparatus was in the substrate exposing configuration is inspected by a radiation beam inspection device. In the radiation beam inspecting configuration, the operation of the lithographic apparatus is modified in order to minimize the difference between the pattern of radiation exposed on the substrate and the required pattern of radiation to be exposed on the substrate.
41 Citations
21 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that conditions a radiation beam;
a patterning device that modulates the radiation beam;
a projection system that projects the modulated radiation beam onto a target portion of a substrate; and
a radiation beam inspection device that inspects at least a part of the modulated radiation beam;
wherein in a substrate exposing configuration, the lithographic apparatus exposes a pattern of radiation on the substrate using the modulated radiation beam, and wherein in a radiation beam inspecting configuration, the radiation beam inspection device inspects the pattern of radiation that would be exposed on the substrate if the lithographic apparatus was in the substrate exposing configuration. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A method of optimizing operation of a lithographic apparatus for formation of a device on a substrate using a lithographic apparatus, the method comprising:
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modulating a radiation beam using a patterning device;
projecting the modulated beam of radiation onto a radiation beam inspection device that inspects at least a part of the modulated radiation beam to determine a corresponding pattern that would be exposed on a substrate if the modulated beam of radiation were projected on the substrate; and
determining at least one modification of the operation of the lithographic apparatus to minimize the difference between a required pattern to be exposed on the substrate and the pattern determined by the radiation beam inspection device. - View Dependent Claims (19, 20, 21)
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Specification