Pattern inspection apparatus and method and reticle for use therein

• US 20070053578A1
• Filed: 12/16/2005
• Published: 03/08/2007
• Est. Priority Date: 09/07/2005
• Status: Abandoned Application

• Current Assignee: Advanced Mask Inspection Technology, Inc. (Toshiba Corporation)
• Original Assignee: Advanced Mask Inspection Technology, Inc. (Toshiba Corporation)
• Inventors: Harabe, Nobuyuki
• Application Number:
  US11/304,664
• Publication Number:
  US 20070053578A1
• Time in Patent Office: Days
• US Class Current: 382/145
• CPC Class Codes: G06T 2207/30148 Semiconductor; IC; Wafer
• CPC Class Codes: G06T 7/001 using an image reference approach

Abstract

A method and apparatus for performing appropriate inspection by selecting a pattern comparison technique in accordance with the pattern feature of an object being tested are disclosed. The pattern inspection apparatus includes an optical image acquisition unit which acquires an optical image of the test object. A plurality of types of feature comparator units are provided for comparing identical patterns at different positions on the test object based on feature data indicating pattern features of the test object. During comparison of the identical patterns of the optical image, a selector unit selects an adequate kind of feature comparator from the pattern feature data of the test object.

Claims

1. A pattern inspection apparatus comprising:

an optical image acquisition unit operative to obtain an optical image of an object being tested;

a plurality of types of feature comparison units operative to compare, based on feature data indicative of pattern features of the optical image of the test object, identical patterns at different positions on the test object; and

a selector unit operative to select, during comparison of the identical patterns of the optical image, a kind of feature comparison unit from the feature data of a pattern under inspection.

2. The apparatus according to claim 1, further comprising:

a common comparison unit serving as a common comparator means to all patterns, for comparison of identical patterns at different positions on the test object.

3. The apparatus according to claim 1, wherein said feature comparison units compare any one of a pattern line width, an amount of pattern transmitted light, roughness of a pattern edge, and a relative position of adjacent locations of the pattern.

4. A pattern inspection apparatus comprising:

an optical image acquisition unit operative to obtain an optical image of an object being tested;

a reference image creation unit operative to make a reference image from design data of a pattern of the test object;

a plurality of types of feature comparison units operative to compare, based on feature data indicative of pattern features of the test object, the optical image to the reference image; and

a selector unit operative to select, when comparing

between the optical image and the reference image, a kind of feature comparison unit from the feature data of a pattern to be inspected.

5. The apparatus according to claim 4, further comprising:

a common comparison unit for use as a common comparator means to all patterns, for comparison of an optical image and a reference image.

6. The apparatus according to claim 4, wherein said feature comparison units compare any one of a pattern line width, an amount of pattern transmitted light, roughness of a pattern edge, and a relative position of adjacent locations of the pattern.

7. A pattern inspection method comprising:

an optical image acquisition step of obtaining an optical image of an object being tested;

a plurality of kinds of feature comparison steps of comparing, based on feature data indicative of pattern features of the test object, identical patterns at different positions on the test object; and

a selection step of selecting, when comparing an optical image and a reference image, a feature comparison step from the feature data of a pattern under inspection.

8. The method according to claim 7, further comprising:

a common comparison step applicable in common to all patterns, for comparing identical patterns at different positions on the test object.

9. The method according to claim 7, wherein the feature comparison steps include comparing any one of a pattern linewidth, an amount of pattern transmitted light, roughness of a pattern edge and a relative position of adjacent locations of the pattern.

10. A pattern inspection method comprising:

an optical image acquisition step of acquiring an optical image of an object being tested;

a reference image creation step of making a reference image from design data of a pattern of the test object;

a plurality of kinds of feature comparison steps of comparing, based on feature data indicative of pattern features of the test object, the optical image to the reference image; and

a selection step of selecting, when comparing the optical image to the reference image, a feature comparison step from the feature data of a pattern under inspection.

11. The method according to claim 10, further comprising:

a common comparison step for comparison of an optical image to a reference image in a way commonized to all patterns.

12. The method according to claim 10, wherein the feature comparison steps include comparing any one of a pattern linewidth, an amount of pattern transmitted light, roughness of a pattern edge and a relative position of adjacent locations of the pattern.

13. A pattern inspection method comprising:

storing in advance a plurality of kinds of feature comparison schemes adaptable for comparison of a plurality of different types of pattern features;

obtaining an optical image of an object being tested and having a pattern;

upon receipt of feature data indicative of a feature of the pattern of the test object, using the data to select from among said schemes at least one feature comparison scheme applicable to said test object; and

using the selected feature comparison scheme to compare identical pattern portions at different locations on said test object to thereby inspect said test object for defects.

14. The method of claim 13 further comprising:

comparing said identical pattern portions by a common comparison technique applicable in common to all of a collection of predefined patterns.

15. A pattern inspection method comprising:

prestoring a plurality of kinds of feature comparison schemes applicable respectively to a plurality of prespecified types of pattern features;

obtaining an optical image of an object being tested and having a pattern;

receiving design data of the pattern of the test object to make a reference image;

receiving feature data indicative of a feature of the test object pattern to select, based on said feature data, at least one feature comparison scheme to be applied to said

test object from among said feature comparison schemes; and

using the selected feature comparison scheme to compare said optical image to said reference image to thereby inspect said test object for defects.

16. The method of claim 15 further comprising:

comparing said optical image to said reference image by a common comparison technique employable in common to all of a collection of predefined patterns.

17. The method of claim 15 wherein said pattern features include a pattern line width, an amount of pattern-transmitted light, a pattern edge roughness, and relative positions of adjacent pattern portions.

18. A reticle with pattern inspection applied thereto by common comparison of optical images with respect to identical patterns at different positions on the reticle and with further pattern inspection being applied to the reticle

by a plurality of kinds of optical image feature comparisons based on feature data indicative of reticle pattern features concerning identical patterns at different positions on said reticle.

19. A reticle with pattern inspection applied thereto by common comparison of an optical image of the reticle to a reference image and with further pattern inspection being applied to said reticle by a plurality of kinds of feature comparisons of optical and reference images based on feature data indicative of reticle pattern features.