Apparatus and method for forming polycrystalline silicon thin film
First Claim
1. A method for forming a polycrystalline silicon thin film by including depositing an amorphous silicon layer on a glass substrate and forming a metal layer on the amorphous silicon layer to crystallize the amorphous silicon layer, the method comprising:
- a metal nucleus adsorbing step of introducing a vapor phase metal compound into a process space where the glass substrate having the amorphous silicon formed thereon is disposed, to adsorb a metal nucleus contained in the metal compound into the amorphous silicon layer;
a metal nucleus distribution region-forming step of forming a community region including a plurality of silicon particles every metal nucleus in a plane boundary region occupied by the metal compound by a self-limited mechanism due to the adsorption of the metal nucleus; and
an excess gas-removing step of purging and removing an excess gas which is not adsorbed in the metal nucleus distribution region-forming step.
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Abstract
Apparatus and method for forming a polycrystalline silicon thin film by converting an amorphous silicon thin film into the polycrystalline silicon thin film using a metal are provided. The method includes: a metal nucleus adsorbing step of introducing a vapor phase metal compound into a process space where the glass substrate having the amorphous silicon formed thereon is disposed, to adsorb a metal nucleus contained in the metal compound into the amorphous silicon layer; a metal nucleus distribution region-forming step of forming a community region including a plurality of silicon particles every metal nucleus in a plane boundary region occupied by the metal compound by a self-limited mechanism due to the adsorption of the metal nucleus; and an excess gas removing step of purging and removing an excess gas which is not adsorbed in the metal nucleus distribution region-forming step.
379 Citations
18 Claims
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1. A method for forming a polycrystalline silicon thin film by including depositing an amorphous silicon layer on a glass substrate and forming a metal layer on the amorphous silicon layer to crystallize the amorphous silicon layer, the method comprising:
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a metal nucleus adsorbing step of introducing a vapor phase metal compound into a process space where the glass substrate having the amorphous silicon formed thereon is disposed, to adsorb a metal nucleus contained in the metal compound into the amorphous silicon layer;
a metal nucleus distribution region-forming step of forming a community region including a plurality of silicon particles every metal nucleus in a plane boundary region occupied by the metal compound by a self-limited mechanism due to the adsorption of the metal nucleus; and
an excess gas-removing step of purging and removing an excess gas which is not adsorbed in the metal nucleus distribution region-forming step. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. In an apparatus for forming a polycrystalline silicon thin film including an amorphous silicon deposition apparatus having a first reaction chamber that is a process space, for depositing an amorphous silicon layer on a glass substrate is installed, and a metal nucleus deposition apparatus having a second reaction chamber that is a separate process space from the deposition apparatus, for depositing a metal nucleus on the glass substrate having the amorphous silicon layer formed thereon, the apparatus for forming a polycrystalline silicon thin film comprising:
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a source gas supply unit (10) for supplying a vapor phase metal compound for an adsorption of a metal nucleus into a reaction chamber providing a process space, together with a deposition gas supplying unit (12) for deposition of an amorphous silicon layer;
a gas exhaust unit (14) for exhausting the reacted deposition gas and an excess gas; and
a heating unit (16) disposed in the reaction chamber (1) to provide the reaction chamber with a thermal decomposition temperature environment for the deposition of the amorphous silicon layer and a thermal treatment environment for adsorption of the metal nucleus, wherein the reaction chamber (1) is included in the apparatus for forming a polycrystalline silicon thin film, as an in-situ process reaction chamber for performing a step of depositing the amorphous silicon layer and a step of adsorbing the metal nucleus in a same process space in-situ using the source gas supply unit (10), the gas exhaust unit (14) and the heating unit (16).
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17. In an apparatus for forming a polycrystalline silicon thin film including a metal nucleus deposition apparatus having a first reaction chamber that is a process space, for depositing a metal nucleus on a glass substrate having an amorphous silicon layer formed thereon, and a crystallization process apparatus having a second reaction chamber that is a separate process space from the metal nucleus deposition apparatus, for thermally treating the glass substrate with the metal nucleus to perform a crystallization of the amorphous silicon layer, the apparatus for forming a polycrystalline silicon thin film comprising:
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a source gas supply unit (10) for supplying a vapor phase metal compound for an adsorption of a metal nucleus into a reaction chamber providing a process space;
a gas exhaust unit (14) for exhausting an excess gas; and
a heating unit (16) disposed in the reaction chamber (1) to provide the reaction chamber with a thermal decomposition temperature environment for the adsorption of the metal nucleus and a thermal treatment environment for crystallization of the amorphous silicon layer, wherein the reaction chamber (1) is included in the apparatus for forming a polycrystalline silicon thin film, as an in-situ process reaction chamber for performing a step of adsorbing the metal nucleus on the glass substrate and a thermal treatment step in a same process space in-situ using the source gas supply unit (10), the gas exhaust unit (14) and the heating unit (16).
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18. In an apparatus for forming a polycrystalline silicon thin film including a metal nucleus deposition apparatus having a first reaction chamber that is a process space, for depositing a metal nucleus on a glass substrate having an amorphous silicon layer formed thereon, and a crystallization process apparatus having a second reaction chamber that is a separate process space from the metal nucleus deposition apparatus, for thermally treating the glass substrate with the metal nucleus to perform a crystallization of the amorphous silicon layer, the apparatus for forming a polycrystalline silicon thin film comprising:
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a source gas supply unit (10) for supplying a vapor phase metal compound for an adsorption of a metal nucleus into a distribution process reaction chamber providing a process space;
a gas exhaust unit (14) for exhausting an excess gas;
a heating unit (16) provided for an adsorption of a metal nucleus;
a crystallization process reaction chamber (18) separately disposed from the distribution process reaction chamber (1) and provided with the heating unit (16);
wherein the crystallization process reaction chamber (18) is connected with the distribution process reaction chamber through a loadlock room (20) having an end effector (22) for loading/unloading the glass substrate such that the glass substrate (100) transferred from the distribution process reaction chamber (1) is thermally treated.
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Specification