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MONITORING PROCESSING OF A SUBSTRATE IN A PROCESSING CHAMBER

  • US 20070068456A1
  • Filed: 11/19/2006
  • Published: 03/29/2007
  • Est. Priority Date: 10/06/1997
  • Status: Abandoned Application
First Claim
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1. A substrate processing apparatus comprising:

  • (a) a process chamber comprising walls defining an enclosure for processing a substrate, and having at least one window to allow a radiation to be transmitted therethrough; and

    (b) a process monitoring assembly to monitor a process being conducted in the chamber, the process monitoring assembly comprising a plurality of signal sensors that each receive a radiation that is reflected from the substrate and that passes through the window, each signal sensor being capable of generating a signal in relation to a received radiation.

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