Exposure apparatus, exposure method, and device fabricating method
First Claim
Patent Images
1. An exposure apparatus that exposes a substrate through an immersion region, comprising:
- an optical element that has a concave surface from which exposure light emerges; and
a surface that is provided to surround an optical path of the exposure light, an interface of a liquid of the immersion region being held between the surface and an object, the object being disposed at a position where the object can be irradiated by the exposure light.
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Abstract
An exposure apparatus is provided with an optical element, which has a concave surface from which an exposure light emerges, and a surface, which is provided so that it surrounds the optical path of the exposure light. An interface of a liquid of an immersion region is held between the surface and an object, which is disposed at a position where it can be irradiated by the exposure light.
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Citations
46 Claims
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1. An exposure apparatus that exposes a substrate through an immersion region, comprising:
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an optical element that has a concave surface from which exposure light emerges; and
a surface that is provided to surround an optical path of the exposure light, an interface of a liquid of the immersion region being held between the surface and an object, the object being disposed at a position where the object can be irradiated by the exposure light. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. An exposure method, comprising:
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forming an immersion region so that a space between an object and a concave surface of an optical element is filled with a liquid, an interface of the liquid being positioned between the object and a surface, the surface being provided to surround the optical path of exposure light; and
exposing a substrate through the immersion region. - View Dependent Claims (17, 18, 19, 20)
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21. An exposure apparatus that exposes a substrate by radiating exposure light onto the substrate, comprising:
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a projection optical system that projects a pattern image onto the substrate and that comprises a first optical element, the first optical element having a first surface that the exposure light impinges and a second surface from which the exposure light emerges;
wherein,the first surface and the second surface are substantially concentric and are spherical surfaces; and
the first optical element is an element of a plurality of optical elements of the projection optical system that is closest to an image plane of the projection optical system. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38)
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39. An exposure apparatus that exposes a substrate by radiating exposure light onto the substrate, comprising:
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an optical element that has a concave surface part from which the exposure light emerges;
a lower surface that is provided to surround the concave surface part; and
a side surface that is provided on the outer side of the lower surface with respect to the optical axis of the optical element and that faces the optical axis. - View Dependent Claims (40, 41, 42, 43)
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44. An exposure method that exposes a substrate by radiating exposure light onto the substrate, comprising:
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radiating the exposure light to an optical element, the optical element opposing a front surface of the substrate and having a concave surface part from which the exposure light emerges; and
irradiating the substrate with the exposure light in a state in which a liquid is filled between the concave surface part of the optical element and a front surface of the substrate;
whereinthe liquid is contacted with a lower surface, which is provided to surround the concave surface part, and a side surface, which is provided on the outer side of the lower surface with respect to the optical axis of the optical element and that faces the optical axis. - View Dependent Claims (45, 46)
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Specification