NONVOLATILE SEMICONDUCTOR MEMORY, FABRICATION METHOD FOR THE SAME, SEMICONDUCTOR INTEGRATED CIRCUITS AND SYSTEMS
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Abstract
A nonvolatile semiconductor memory which is configured to include a plurality of word lines disposed in a row direction; a plurality of bit lines disposed in a column direction perpendicular to the word lines; memory cell transistors having a charge storage layer, provided in the column direction and an electronic storage condition of the memory cell transistor configured to be controlled by one of the plurality of the word lines connected to the memory cell; a plurality of first select transistors, each including a gate electrode, selecting the memory cell transistors provided in the column direction, arranged in the column direction and adjacent to the memory cell transistors at a first end of the memory cell transistors; and a first select gate line connected to each of the gate electrodes of the first select transistors.
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Citations
21 Claims
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1. (canceled)
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2. A nonvolatile semiconductor memory embedded in a card operable so as to receive and transfer a predetermined signal from an external device, and the nonvolatile semiconductor memory comprising:
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a plurality of word lines disposed in a row direction;
a plurality of bit lines disposed in a column direction perpendicular to the word lines;
memory cell transistors having a source region, a drain region, a gate electrode and a charge storage layer, provided in the column direction and an electronic storage condition of the memory cell transistor configured to be controlled by one of the plurality of the word lines connected to the memory cell;
a plurality of first select transistors, each including a gate electrode, selecting the memory cell transistors provided in the column direction, arranged in the column direction and adjacent to the memory cell transistors at a first end of the memory cell transistors; and
a first select gate line connected to each of the gate electrodes of the first select transistors, wherein the plurality of the word lines have a wiring line width which is the same as the first select gate line. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A nonvolatile semiconductor memory formed in a mixed memory loading microprocessor unit (MPU) embedded in a card, and the nonvolatile semiconductor memory comprising:
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a plurality of word lines disposed in a row direction;
a plurality of bit lines disposed in a column direction perpendicular to the word lines;
memory cell transistors having a source region, a drain region, a gate electrode and a charge storage layer, provided in the column direction and an electronic storage condition of the memory cell transistor configured to be controlled by one of the plurality of the word lines connected to the memory cell;
a plurality of first select transistors, each including a gate electrode, selecting the memory cell transistors provided in the column direction, arranged in the column direction and adjacent to the memory cell transistors at a first end of the memory cell transistors; and
a first select gate line connected to each of the gate electrodes of the first select transistors, wherein the plurality of the word lines have a wiring line width which is the same as the first select gate line. - View Dependent Claims (13)
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14. A nonvolatile semiconductor memory formed in a microprocessor unit (MPU) embedded in a card comprising:
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a plurality of word lines disposed in a row direction;
a plurality of bit lines disposed in a column direction perpendicular to the word lines;
memory cell transistors having a source region, a drain region, a gate electrode and a charge storage layer, provided in the column direction and an electronic storage condition of the memory cell transistor configured to be controlled by one of the plurality of the word lines connected to the memory cell;
a plurality of first select transistors, each including a gate electrode, selecting the memory cell transistors provided in the column direction, arranged in the column direction and adjacent to the memory cell transistors at a first end of the memory cell transistors; and
a first select gate line connected to each of the gate electrodes of the first select transistors, wherein the plurality of the word lines have a wiring line width which is the same as the first select gate line. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21)
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Specification