Reference wafer and process for manufacturing same
First Claim
1. A method of constructing a calibration file for an archive media, the method comprising:
- providing an archive media which includes etched alignment attributes;
exposing a pattern of complementary alignment attributes onto the archive media such that the pattern of complementary alignment attributes overlay and interlock with the etched alignment attributes thereby forming completed alignment attributes;
measuring offsets in the completed alignment attributes; and
constructing a calibration file for the archive media based upon the offset measurements and dynamic intrafield lens distortion data of a lens used to expose the pattern of complementary alignment attributes, and calibration error of the complementary alignment attributes.
1 Assignment
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Accused Products
Abstract
An apparatus and method for manufacturing and using a calibrated registration reference wafer in a semiconductor manufacturing facility where an archive media includes etched alignment attributes. Exposing a pattern of complementary alignment attributes onto the archive media such that the pattern of complementary alignment attributes overlay and interlock with the etched alignment attributes thereby forming completed alignment attributes. Then, measuring offsets in the completed alignment attributes and constructing a calibration file for the archive media based upon the offset measurements and other characteristic data of the exposure tool.
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Citations
33 Claims
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1. A method of constructing a calibration file for an archive media, the method comprising:
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providing an archive media which includes etched alignment attributes;
exposing a pattern of complementary alignment attributes onto the archive media such that the pattern of complementary alignment attributes overlay and interlock with the etched alignment attributes thereby forming completed alignment attributes;
measuring offsets in the completed alignment attributes; and
constructing a calibration file for the archive media based upon the offset measurements and dynamic intrafield lens distortion data of a lens used to expose the pattern of complementary alignment attributes, and calibration error of the complementary alignment attributes. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of constructing a calibration file for an archive media;
- the method comprising;
providing an archive media which includes etched alignment attributes;
exposing a pattern of a calibration reticle onto the archive media, wherein the pattern of the calibration reticle includes complementary alignment attributes, and the pattern is positioned such that the pattern of complementary alignment attributes overlay and interlock with the etched alignment attributes thereby forming interlocking rows and columns of completed alignment attributes between adjacent static calibration reticle exposure fields;
measuring offsets in the completed alignment attributes; and
constructing a calibration file for the archive media based upon the offset measurements and intrafield lens distortion data of a lens used to expose the pattern of complementary alignment attributes, and manufacturing error data for the calibration reticle. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
- the method comprising;
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20. A method of constructing a calibration file for an archive media;
- the method comprising;
providing an archive media which includes etched alignment attributes;
exposing a pattern of a calibration reticle onto the archive media, wherein the pattern of the calibration reticle includes central overlay groups and offset overlay groups, and the pattern is positioned such that a complementary alignment attribute of the central overlay group interlocks with an etched alignment attribute thereby forming a completed alignment attribute archive, and wherein attributes in adjacent exposures of the calibration reticle pattern interlock with complementary alignment attributes of the offset overlay groups thereby forming completed alignment attributes calibration;
measuring offsets in the completed alignment attribute archive and completed alignment attribute calibration; and
constructing a calibration file for the archive media based upon the offset measurements and manufacturing error data for the calibration reticle. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27)
- the method comprising;
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28. A reticle for use in constructing a calibration file for an archive media;
- the reticle comprising a pattern of complementary alignment attributes that are exposed onto an archive media such that the pattern of complementary alignment attributes overlay and interlock with a etched alignment attributes on the archive thereby forming completed alignment attributes, wherein measurements of offsets in the completed alignment attributes are used to construct a calibration file for the archive media based upon the offset measurements and dynamic intrafield lens distortion data of a lens used to expose the pattern of complementary alignment attributes, and calibration error of the complementary alignment attributes.
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29. A calibration reticle for use in constructing a calibration file for an archive media;
- the calibration reticle comprising a pattern exposed onto an archive media, wherein the pattern of the calibration reticle includes complementary alignment attributes, and the reticle is positioned such that the pattern of complementary alignment attributes overlay and interlock etched alignment attributes on the archive media, thereby forming interlocking rows and columns of completed alignment attributes between adjacent static calibration reticle exposure fields, wherein measurements of offsets in the completed alignment attributes are used to construct a calibration file for the archive media based upon the offset measurements and intrafield lens distortion data of a lens used to expose the pattern of complementary alignment attributes, and manufacturing error data for the calibration reticle.
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30. A method of manufacturing a reference substrate on a projection imaging tool, the method comprising:
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providing at least one reticle, the at least one reticle including interlocking rows and columns of alignment attributes;
exposing the at least one reticle onto a substrate that includes a recording media, in a pattern such that adjacent exposures create a pattern of interlocking alignment attributes;
measuring overlay errors of desired alignment attributes and calculating positional coordinates of the desired alignment attributes with respect to intra-field error data and overlay errors; and
creating a calibration file associated with the reference substrate that records the positional coordinates of the alignment attributes. - View Dependent Claims (31, 32, 33)
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Specification