Method of manufacturing display panel for flexible display device
First Claim
1. A method of manufacturing a display panel for a liquid crystal display, comprising:
- mounting a flexible substrate in a sputtering chamber; and
depositing a thin film by sputtering a target on the flexible substrate, wherein the sputtering is performed at a temperature of between about 80°
C. to about 150°
C.
2 Assignments
0 Petitions
Accused Products
Abstract
A liquid crystal display panel manufacturing method includes forming at least one thin film on a flexible plastic substrate by sputtering at a temperature of about 80° C. to about 150° C. Sputtering can be in a chamber evacuated to about 1×10−6 Torr to about 9×10−6 Torr. Sputtering targets and films sputtered on substrates include materials that are conductive or insulating, organic or inorganic, metal or metal alloy, reflective metal or transparent conductive, or combinations thereof. Thin film and pattern formation employ photolithography with laminated or liquid films. Films may be sputtered on opposing sides of a substrate and may be multilayered.
20 Citations
14 Claims
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1. A method of manufacturing a display panel for a liquid crystal display, comprising:
-
mounting a flexible substrate in a sputtering chamber; and
depositing a thin film by sputtering a target on the flexible substrate, wherein the sputtering is performed at a temperature of between about 80°
C. to about 150°
C. - View Dependent Claims (2, 3, 4, 5)
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6. A method of manufacturing a display panel for a liquid crystal display, comprising:
-
preparing a flexible substrate;
forming a gate line on the flexible substrate;
depositing a gate insulating layer on the flexible substrate;
forming a semiconductor layer on the gate insulating layer;
forming a data line and a drain electrode on the semiconductor layer; and
forming a pixel electrode that is electrically connected to the drain electrode, wherein at least one of the forming of a gate line, the depositing of a gate insulating layer, the forming of a semiconductor layer, the forming of a drain electrode and a data line including a source electrode, and the forming of a pixel electrode includes sputtering at a temperature of between about 80°
C. to about 150°
C. - View Dependent Claims (7, 8, 9, 10)
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11. A method of manufacturing a display panel for a liquid crystal display, comprising:
-
preparing a flexible substrate;
forming a gate line on the flexible substrate;
depositing a gate insulating layer on the flexible substrate;
depositing a semiconductor layer and an ohmic contact layer on the gate insulating layer;
depositing a conductive layer on the ohmic contact layer;
forming a first photosensitive film pattern on the conductive layer;
etching the conductive layer, the ohmic contact layer, and the semiconductor layer using a first photosensitive film pattern as an etching mask;
forming a second photosensitive film pattern by removing the first photosensitive film pattern to a predetermined thickness;
etching the conductive layer and exposing a part of the ohmic contact layer using the second photosensitive film pattern as an etching mask; and
forming a pixel electrode on the conductive layer, wherein at least one of the forming of a gate line, the depositing of a gate insulating layer, the depositing of a semiconductor layer and an ohmic contact layer, the depositing of the conductive layer, and the forming of a pixel electrode includes sputtering at a temperature of between about 80°
C. to about 150°
C. - View Dependent Claims (12, 13, 14)
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Specification