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System and method for compensating for radiation induced thermal distortions

  • US 20070076180A1
  • Filed: 10/25/2005
  • Published: 04/05/2007
  • Est. Priority Date: 10/04/2005
  • Status: Active Grant
First Claim
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1. A lithographic apparatus, comprising:

  • a patterning device that modulates a radiation beam;

    a projection system that projects the modulated radiation beam onto a target portion of a substrate;

    a substrate position controller that moves the substrate relative to the projection system sequentially through a plurality of exposure positions; and

    a substrate-position-based expansion-compensator that interacts with the substrate position controller to modify the exposure positions to at least partially compensate for thermally-induced geometrical changes of at least one of the substrate and the projection system.

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