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Process margin using discrete assist features

  • US 20070082277A1
  • Filed: 10/07/2005
  • Published: 04/12/2007
  • Est. Priority Date: 10/07/2005
  • Status: Active Grant
First Claim
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1. A method of improving a process margin of a lithographic imaging system, comprising:

  • identifying a semi-isolated pattern feature on a mask as a potential limiting factor to a process margin for a lithographic imaging technique;

    determining a resolution threshold for the imaging technique; and

    placing one or more discretized sub-resolution assist features near the semi-isolated mask feature.

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