Method for preparing plasma display panel

• US 20070082575A1
• Filed: 09/29/2006
• Published: 04/12/2007
• Est. Priority Date: 10/07/2005
• Status: Active Grant

• Current Assignee: Samsung SDI Company Limited
• Original Assignee: Samsung SDI Company Limited
• Inventors: Kim, Myoung-Sup, Hwang, Yong-Shik, Shin, Hyea-Weon, Choi, Young-Do, Kim, Jeong-Nam
• Granted Patent: US 7,677,942 B2
• Time in Patent Office: Days
• US Class Current: 445/24
• CPC Class Codes: C03C 12/00 Powdered glass C03C8/02 takes precedence; Bead compositions
• CPC Class Codes: C03C 14/00 Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix devitrified glass ceramics C03C10/00
• CPC Class Codes: C03C 2214/12 Polymers
• CPC Class Codes: C03C 3/091 containing aluminium
• CPC Class Codes: C03C 3/093 containing zinc or zirconium
• CPC Class Codes: C03C 3/142 containing lead
• CPC Class Codes: H01J 11/14 with main electrodes provided only on one side of the discharge space
• CPC Class Codes: H01J 11/38 Dielectric or insulating layers
• CPC Class Codes: H01J 9/02 Manufacture of electrodes or electrode systems

Abstract

A method of making a plasma display panel, whereby an address electrode is formed on a front substrate, a green sheet is formed to cover the address electrode, a dielectric layer pattern is formed by exposing, developing, and firing the green sheet, a composition for a display electrode is filled in the dielectric layer pattern and then fired to form a patterned display electrode, and a dielectric layer is formed to cover the patterned display electrode, thereby fabricating a front substrate. The green sheet includes a first green sheet that is formed using a dielectric composition, and a second green sheet that is formed on the first green sheet and using a photosensitive dielectric composition.

Claims

1. A method of making a plasma display panel, comprising:

forming an address electrode on a front substrate;

forming a green sheet to cover the address electrode, the green sheet comprising a first green sheet and a second green sheet formed on the first green sheet, the first green sheet formed using a composition for a first dielectric layer, the second green sheet formed using a photosensitive composition for a second dielectric layer,;

forming a dielectric layer pattern by exposing, developing, and firing the second green sheet;

filling a composition for a display electrode in the dielectric layer pattern and then firing the filled composition to form a patterned display electrode; and

forming a third dielectric layer on the patterned display electrode.

2. The method of claim 1, wherein the composition for the first dielectric layer comprises at least one glass powder selected from the group consisting of ZnO, B₂O₃, Al₂O₃, SiO₂, SnO, P₂O₅, Sb₂O₃, and Bi₂O₃.

3. The method of claim 2, wherein the glass powder is at least one selected from the group consisting of zinc oxide-boron oxide-silicon oxide (ZnO—

B₂O₃—

SiO₂), zinc oxide-boron oxide-silicon oxide-aluminum oxide (ZnO—

B₂O₃—

SiO₂—

Al₂O₃), bismuth oxide-boron oxide-silicon oxide (Bi₂O₃—

B₂O₃—

SiO₂), bismuth oxide-boron oxide-silicon oxide-aluminum oxide (Bi₂O₃—

B₂O₃—

SiO₂—

Al₂O₃), bismuth oxide-zinc oxide-boron oxide-silicon oxide (Bi₂O₃—

ZnO—

B₂O₃—

SiO₂), bismuth oxide-zinc oxide-boron oxide-silicon oxide-aluminum oxide (Bi₂O₃—

ZnO—

B₂O₃—

SiO₂—

₂O₃), and a combination thereof.

4. The method of claim 2, wherein the glass powder further comprises at least one material selected from the group consisting of an oxide of a group 1 to group 5 metal element, an oxide of a lanthanum-based element, and a fluoride of a group 1 metal element.

5. The method of claim 2, wherein the glass powder further comprises at least one selected from the group consisting of Na₂O, Li₂O, K₂O, Cs₂O, MgO, CaO, SrO, BaO, Sc₂O₃, Y₂O₃, TiO₂, ZrO₂, V₂O₅, Nb₂O₅, La₂O₃, CeO₂, Pr₂O₃, Nd₂O₃, Sm₂O₃, Eu₂O₃, Gd₂O₃, Tb₂O₃, Dy₂O₃, Ho₂O₃, Er₂O₃, Tm₂O₃, Yb₂O₃, Lu₂O₃, LiF, KF, and a combination thereof.

6. The method of claim 2, wherein the glass powder has an average particle diameter ranging from 0.1 to 5 μ

m.

7. The method of claim 2, wherein the glass powder has an average particle diameter ranging from 0.5 to 2 μ

m.

8. The method of claim 2, wherein the composition for the first dielectric layer comprises 50 to 70 wt % of the glass powder based on the total weight of the composition for forming the first dielectric layer.

9. The method of claim 2, wherein the composition for the first dielectric layer comprises 55 to 65 wt % of the glass powder based on the total weight of the composition for forming the first dielectric layer.

10. The method of claim 1, wherein the photosensitive composition for the second dielectric layer comprises:

a glass powder;

a photosensitive binder;

a cross-linking compound having at least two ethylene-based double bonds;

a photopolymerization initiator; and

a solvent.

11. The method of claim 10, wherein the glass powder is at least one selected from the group consisting of ZnO, B₂O₃, Al₂O₃, SiO₂, SnO, P₂O₅, Sb₂O₃, Bi₂O₃ and a combination thereof.

12. The method of claim 10, wherein the glass powder is at least one selected from the group consisting of zinc oxide-boron oxide-silicon oxide (ZnO—

B₂O₃—

SiO₂), zinc oxide-boron oxide-silicon oxide-aluminum oxide (ZnO—

B₂O₃—

SiO₂—

Al₂O₃), bismuth oxide-boron oxide-silicon oxide (Bi₂O₃—

B₂O₃—

SiO₂), bismuth oxide-boron oxide-silicon oxide-aluminum oxide (Bi₂O₃—

B₂O₃—

SiO₂—

Al₂O₃), bismuth oxide-zinc oxide-boron oxide-silicon oxide (Bi₂O₃—

ZnO—

B₂O₃—

SiO₂), bismuth oxide-zinc oxide-boron oxide-silicon oxide-aluminum oxide (Bi₂O₃—

ZnO—

B₂O₃—

SiO₂—

₂O₃), and a combination thereof.

13. The method of claim 10, wherein the glass powder further comprises at least one material selected from the group consisting of an oxide of a group 1 to group 5 metal element, an oxide of a lanthanum-based element, and a fluoride of a group 1 metal element.

14. The method of claim 10, wherein the glass powder further comprises at least one selected from the group consisting of Na₂O, Li₂O, K₂O, Cs₂O, MgO, CaO, SrO, BaO, Sc₂O₃, Y₂O₃, TiO₂, ZrO₂, V₂O₅, Nb₂O₅, La₂O₃, CeO₂, Pr₂O₃, Nd₂O₃, Sm₂O₃, Eu₂O₃, Gd₂O₃, Tb₂O₃, Dy₂O₃, Ho₂O₃, Er₂O₃, Tm₂O₃, Yb₂O₃, Lu₂O₃, LiF, NaF, KF, and a combination thereof.

15. The method of claim 10, wherein the glass powder has an average particle diameter ranging from 0.1 to 5 μ

m.

16. The method of claim 10, wherein the glass powder has an average particle diameter ranging from 0.5 to 2 μ

m.

17. The method of claim 10, wherein the glass powder is included in an amount of 50 to 65 wt % based on the total weight of the photosensitive composition for forming the second dielectric layer.

18. The method of claim 10, wherein the glass powder is included in an amount of 55 to 60 wt % based on the total weight of the photosensitive composition for forming the second dielectric layer.

19. The method of claim 10, wherein the photosensitive binder is at least one selected from the group consisting of an acryl-based resin, a styrene resin, a novolac resin, and a polyester resin.

20. The method of claim 10, wherein the photosensitive binder is at least one selected from the group consisting of acrylic acid, methacrylic acid, maleic acid, fumaric acid, crotonic acid, itaconic acid, citraconic acid, mesaconic acid, cinamic acid, mono(2-(meth)acryloyloxyethyl)succinate, ω

-carboxyl-polycaprolactone mono(meth)acrylate, 2-hydroxyethyl(meth)acrylate, 2-hydroxypropyl(meth)acrylate, 3-hydroxypropyl(meth)acrylate, o-hydroxystyrene, m-hydroxystyrene, p-hydroxystyrene, (meth)acrylic acid ester, an aromatic vinyl-based monomer, a conjugated diene, a macromonomer (polymer) having a polymerizable unsaturated group, and a combination thereof.

21. The method of claim 10, wherein the photosensitive binder has a number average molecular weight (Mn) ranging from 5,000 to 50,000.

22. The method of claim 10, wherein the photosensitive binder has an acid value ranging from 20 to 100 mg KOH/g.

23. The method of claim 10, wherein the photosensitive binder is included in an amount of 5 to 10 wt % based on the total weight of the photosensitive composition for the second dielectric layer.

24. The method of claim 10, wherein the photosensitive binder is included in an amount of 5 to 7 wt % based on the total weight of the photosensitive composition for the second dielectric layer.

25. The method of claim 10, wherein the cross-linking compound having at least two ethylene-based double bonds is at least one selected from the group consisting of an acrylate, a methacrylate, a mono-, di-, tri-, or more ester obtained by a reaction of a polybasic acid and hydroxy alkyl(meth)acrylate, and a combination thereof.

26. The method of claim 10, wherein the cross-linking compound having at least two ethylene-based double bonds is at least one selected from the group consisting of 1,4-butanedioldiacrylate, 1,3-butylene glycol diacrylate, ethylene glycol diacrylate, pentaerythrytol tetraacrylate, triethylene glycol diacrylate, dipentaerythrytol diacrylate, sorbitol triacrylate, a bisphenol A diacrylate derivative, trimethylol propane triacrylate, trimethylol propane triacrylate modified with ethylene oxide, dipentaerythrytol polyacrylate, 1,4-butanediol dimethacrylate, 1,3-butylene glycol dimethacrylate, ethylene glycol dimethacrylate, pentaerythrytol tetramethacrylate, triethylene glycol dimethacrylate, dipentaerythrytol dimethacrylate, sorbitol trimethacrylate, bisphenol A dimethacrylate derivative, trimethylol propane trimethacrylate, trimethylol propane trimethacrylate modified with ethylene oxide, dipentaerythrytol polymethacrylate, a copolymer thereof, and a combination thereof.

27. The method of claim 10, wherein the cross-linking compound having at least two ethylene-based double bonds is included in an amount of 1 to 15 wt % based on the total weight of the photosensitive composition for the second dielectric layer.

28. The method of claim 10, wherein the cross-linking compound having at least two ethylene-based double bonds is included in an amount of 3 to 10 wt % based on the total weight of the photosensitive composition for the second dielectric layer.

29. The method of claim 10, wherein the photopolymerization initiator is at least one selected from the group consisting of benzoin, benzoin alkyl ethers, acetophenone-based compounds, aminoacetophenone, anthraquinone, thioxanthone, ketals, benzophenone, xanthone, triazine, imidazole, phosphineoxide, peroxides, and a combination thereof.

30. The method of claim 10, wherein the photopolymerization initiator is at least one selected from the group consisting of benzoin, benzoin methylether, benzoin ethylether, benzoin isopropylethyl, acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 1,1-dichloroacetophenone, α

-amino acetophenone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropanone-1,2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1,2-methylanthraquinone, 2-ethylanthraquinone, 2-t-butylanthraquinone, 2,4-dimethylthioxanthone, acetophenonedimethylketal, benzyldimethylketal, benzophenone, xanthone, triazine, imidazole, (2,6-dimethoxybenzoyl)-2,4,4-trimethylpentylphosphineoxide, bis (2,4,6-trimethylbenzoyl)-phenylphosphineoxide, 2,4,6-trimethylbenzoyldiphenylphosphineoxide, ethyl-2,4,6-trimethylbenzoylphenylphosphinate, and a combination thereof.

31. The method of claim 10, wherein the photopolymerization initiator is included in an amount of 0.1 to 8 wt % based on the total weight of the photosensitive composition for the second dielectric layer.

32. The method of claim 10, wherein the photopolymerization initiator is included in an amount of 0.3 to 5 wt % based on the total weight of the photosensitive composition for the second dielectric layer.

33. The method of claim 10, wherein the solvent is at least one selected from the group consisting of ketone, alcohol, ether-based alcohol, saturated aliphatic monocarboxylic acid alkyl ester, lactic acid ester, ether-based ester, and a combination thereof.

34. The method of claim 10, wherein the solvent is included in an amount of 4 to 30 wt % based on the total weight of the photosensitive composition for the second dielectric layer.

35. The method of claim 10, further comprising at least one additive selected from the group consisting of a sensitizer, a polymerization inhibitor, an oxidation inhibitor, an ultraviolet ray absorber, an antifoaming agent, a dispersing agent, a leveling agent, a plasticizer, and a combination thereof.

36. The method of claim 1, wherein the first green sheet and the second green sheet have a thickness ratio ranging from 3:

1 to 4;

1.

37. The method of claim 1, wherein the second green sheet has a thickness ranging from 5 to 30 μ

m.

38. The method of claim 1, wherein the exposing is performed with a photomask or by direct imaging.

39. The method of claim 1, wherein the developing is performed by spraying a base aqueous solution or by dipping in a base aqueous solution.

40. The method of claim 39, wherein the base aqueous solution comprises at least one base selected from the group consisting of lithium hydroxide, sodium hydroxide, potassium hydroxide, phosphoric acid hydrogen sodium, phosphoric acid hydrogen diammonium, phosphoric acid hydrogen dipotassium, phosphoric acid hydrogen disodium, phosphoric acid dihydrogen ammonium, phosphoric acid dihydrogen potassium, phosphoric acid dihydrogen sodium, lithium silicate, sodium silicate, potassium silicate, lithium carbonate, sodium carbonate, potassium carbonate, lithium borate, sodium borate, potassium borate, ammonia, tetramethyl ammonium hydroxide, trimethyl hydroxyl ethyl ammonium hydroxide, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, ethanolamine, and a combination thereof.

41. The method of claim 39, wherein the base aqueous solution has a concentration of 0.1 to 1%.

42. The method of claim 39, wherein the base aqueous solution has a temperature ranging from 25°

C. to 55°

C.

43. The method of claim 1, further comprising, after the developing, rinsing or performing neutralization with acid to remove unnecessary development solution.

44. The method of claim 1, wherein the firing is performed at a temperature of 480°

C. to 620°

C.

45. The method of claim 1, further comprising forming a protection layer to cover the dielectric layer after forming the dielectric layer on the patterned display electrode.

46. The method of claim 45, wherein the protection layer comprises at least one layer selected from the group consisting of a fluoride layer and an oxide layer.

47. The method of claim 45, wherein the protection layer comprises at least one layer selected from the group consisting of MgF₂, CaF₂, LiF, MgO, Al₂O₃, ZnO, CaO, SrO, SiO₂, La₂O₃, and a combination thereof.

48. A method of making a plasma display panel, comprising:

forming address electrodes on a front substrate;

forming a green sheet on the address electrodes, the green sheet comprising a first dielectric layer and a second dielectric layer on the first dielectric layer, the second dielectric layer being a photosensitive dielectric layer;

patterning the second dielectric layer by exposing, developing, and firing the second dielectric layer to form spaces for display electrodes and discharge cells;

filling a composition for display electrodes in the spaces for the display electrodes and then firing to form patterned display electrodes;

forming a third dielectric layer on the patterned display electrodes;

forming patterned barrier ribs on a rear substrate;

forming phosphor layers between the barrier ribs; and

assembling the front substrate and the rear substrate followed by evacuating and sealing.

49. A green sheet for forming dielectric layers of a plasma display panel, comprising:

a first green sheet made of a dielectric composition; and

a second green sheet formed on the first green sheet, the second green sheet made of a photosensitive dielectric composition.