Adaptive plasma source for generating uniform plasma

• US 20070084405A1
• Filed: 09/08/2004
• Published: 04/19/2007
• Est. Priority Date: 09/09/2003
• Status: Abandoned Application

• Current Assignee: Adaptive Headlamp Technologies Inc. (Quarterhill Inc. (f/k/a Wi-LAN Inc.))
• Original Assignee: Adaptive Headlamp Technologies Inc. (Quarterhill Inc. (f/k/a Wi-LAN Inc.))
• Inventors: Kim, Nam-Hun
• Application Number:
  US10/570,942
• Publication Number:
  US 20070084405A1
• Time in Patent Office: Days
• US Class Current: 118/723.I
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence

Abstract

There is provided an adaptive plasma source, which is arranged at an upper portion of a reaction chamber having a reaction space to form plasma and is supplied with RF (radio frequency) power from an external RF power source to form an electric field inside the reaction space. The adaptive plasma source includes a conductive bushing and at least two unit coils. The bushing is coupled to the RF power source and arranged at an upper central portion of the reaction chamber. The at least two unit coils are branched from the bushing and surround the bushing in a spiral shape and have the number of turns equal to a×(b/m), where a and b are positive integers and m is the number of the unit coils.

Claims

1. An adaptive plasma source arranged at an upper portion of a reaction chamber having a reaction space to form plasma and supplied with RF (radio frequency) power from an external RF power source to form an electric field inside the reaction space, the adaptive plasma source comprising:

a conductive bushing coupled to the RF power source and arranged at an upper central portion of the reaction chamber; and

at least two unit coils branched from the bushing, the unit coils surrounding the bushing in a spiral shape and having the number of turns equal to a×

(b/m), where a and b are positive integers and m is the number of the unit coils.

2. The adaptive plasma source of claim 1, wherein the bushing has a circular shape with a predetermined diameter and the unit coils are branched from positions that are mutually symmetrical at edges of the busing.

3. The adaptive plasma source of claim 1, wherein the bushing has a polygonal shape, and the unit coils have the same polygonal shape as the bushing and spirally surround the bushing.

4. The adaptive plasma source of claim 3, wherein the bushing and the unit coils have a rectangular shape.

5. The adaptive plasma source of claim 3, wherein the bushing and the unit coils have a hexagonal shape.

6. The adaptive plasma source of claim 1, wherein the bushing is arranged on the same plane as the unit coils arranged on the upper portion of the reaction chamber.

7. The adaptive plasma source of claim 1, wherein the bushing is arranged on a second plane located higher than a first plane on which the unit coils arranged on the upper portion of the reaction chamber are disposed.

8. The adaptive plasma source of claim 7, wherein the unit coils are branched from the bushing arranged on the second plane and are extended to the first plane and then arranged on the first plane in a spiral shape.

9. An adaptive plasma source arranged at an upper portion of a reaction chamber having a reaction space to form plasma and supplied with RF (radio frequency) power from an external RF power source to form an electric field inside the reaction space, the adaptive plasma source comprising:

a first conductive bushing arranged at an upper central portion of the reaction chamber on a first plane disposed on an upper portion of the reaction chamber;

at least two first unit coils branched from the first bushing on the first plane, the first unit coils surrounding the first bushing in a spiral shape and having the number of turns equal to a×

(b/m1), where a and b are positive integers and m1 is the number of the first unit coils;

a second conductive bushing arranged corresponding to the first bushing on a second plane located higher than the first plane, the second conductive bushing being elastically connected to the first bushing; and

at least two second unit coils branched from the second bushing on the second plane, the second unit coils surrounding the second bushing in a spiral shape and having the number of turns equal to a×

(b/m2), where a and b are positive integers and m2 is the number of the second unit coils.

10. The adaptive plasma source of claim 9, wherein the first bushing has a cross section equal to or wider than that of the second bushing.

11. The adaptive plasma source of claim 9, further comprising:

at least one third bushing coupled to the first and second bushings on at least one plane between the first plane and the second plane; and

at least one third unit coil branched from the third bushing and arranged in the same manner as the first unit coils and the second unit coils.