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Method and apparatus for producing ultra-high purity water

  • US 20070084793A1
  • Filed: 10/18/2005
  • Published: 04/19/2007
  • Est. Priority Date: 10/18/2005
  • Status: Abandoned Application
First Claim
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1. A system for providing ultrapure water to a immersion lithography device, the system comprising:

  • a prefilter in fluid communication with a water supply;

    a reverse osmosis unit in fluid communication with the prefilter;

    a deionization unit in fluid communication with the reverse osmosis unit;

    an ultraviolet light unit in fluid communication with the deionization unit;

    a filter in fluid communication with the ultraviolet light unit;

    a degasser in fluid communication with the filter; and

    an ultrafilter in fluid communication with the degasser;

    wherein ultrapure water exits the system from the ultrafilter and may be used by the immersion lithography device.

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