Tantalum sputtering target and method of fabrication
First Claim
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1. A process for processing metal comprising clock rolling a metal plate until the desired thickness is achieved to form a rolled plate.
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Abstract
A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.
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Citations
59 Claims
- 1. A process for processing metal comprising clock rolling a metal plate until the desired thickness is achieved to form a rolled plate.
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24. A method to reduce or control earing in metal plate comprising clock rolling said metal plate with at least two rolling passes.
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28. A process for making a circular metal article comprising processing a metal ingot having a cylindrical shape so that the cylindrical shape is maintained throughout said process.
- 29. A BCC metal article that deforms isotropically in any direction within the plane of the metal article.
- 34. A BCC metal plate comprising an axial symmetrical texture with an axis.
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35. A BCC metal plate having the pole figures of
FIG. 3 .
- 44. A metal article having a primary texture, wherein said metal article has a percent texture banding area of less than 0.5% that is inconsistent or non-uniform with respect to the primary texture present in said metal article.
Specification