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Tantalum sputtering target and method of fabrication

  • US 20070089815A1
  • Filed: 02/10/2005
  • Published: 04/26/2007
  • Est. Priority Date: 02/10/2005
  • Status: Active Grant
First Claim
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1. A process for processing metal comprising clock rolling a metal plate until the desired thickness is achieved to form a rolled plate.

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