IMMERSION LITHOGRAPHY APPARATUS AND METHODS
First Claim
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1. A lithography apparatus, comprising:
- an imaging lens module;
a substrate table positioned underlying the imaging lens module and configured to hold a substrate; and
a cleaning module adapted to clean the lithography apparatus, wherein the cleaning module is selected from the group consisting of an ultrasonic unit, a scrubber, a fluid jet, an electrostatic cleaner, and combinations thereof.
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Abstract
A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; and a cleaning module adapted to clean the lithography apparatus. The cleaning module is selected from the group consisting of an ultrasonic unit, a scrubber, a fluid jet, an electrostatic cleaner, and combinations thereof.
136 Citations
20 Claims
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1. A lithography apparatus, comprising:
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an imaging lens module;
a substrate table positioned underlying the imaging lens module and configured to hold a substrate; and
a cleaning module adapted to clean the lithography apparatus, wherein the cleaning module is selected from the group consisting of an ultrasonic unit, a scrubber, a fluid jet, an electrostatic cleaner, and combinations thereof. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. An immersion lithography apparatus, comprising:
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an imaging lens module;
a substrate table configured to secure a substrate and positioned under the imaging lens;
a fluid module configured to provide a fluid to a space between the imaging lens module and a substrate on the stage; and
an ultrasonic module configured to provide ultrasonic energy to clean the immersion lithography apparatus. - View Dependent Claims (16, 17, 18)
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19. A method, comprising:
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providing a lithography apparatus having a cleaning module, wherein the cleaning module includes at least one of a scrubber, a fluid jet, an ultrasonic unit, and an electrostatic cleaner;
performing a cleaning process to the lithography apparatus by utilizing the cleaning module; and
performing an exposure process to a substrate coated with an imaging layer. - View Dependent Claims (20)
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Specification