Preparation of a PH sensor, the prepared PH sensor, system comprising the same and measurement using the system
First Claim
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1. A preparation method of a pH sensor which is an extended gate ion-sensitive field effect transistor structure, the method comprising the steps of:
- providing an extended gate ion sensitive field effect transistor comprising an extended gate region; and
forming a titanium nitride film on the extended gate region by radio frequency (RF) sputtering deposition to obtain a pH sensor;
wherein the RF sputtering deposition is performed with a titanium target under conditions of a mixture of Ar and N2 at a ratio of 1;
2 to 1;
5 and a flow rate of 60-90 sccm, a pressure of 0.01 to 0.04 torr, and a power of 85 to 120 W.
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Abstract
Preparation of a pH sensor, the prepared pH sensor, system comprising the same, and measurement using the system. The pH sensor is an extended gate field effect transistor (EGFET) structure. The preparation includes the steps of providing an extended gate ion sensitive field effect transistor comprising an extended gate region, forming a titanium nitride film on the extended gate region by RF sputtering deposition to obtain a pH sensor.
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Citations
23 Claims
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1. A preparation method of a pH sensor which is an extended gate ion-sensitive field effect transistor structure, the method comprising the steps of:
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providing an extended gate ion sensitive field effect transistor comprising an extended gate region; and
forming a titanium nitride film on the extended gate region by radio frequency (RF) sputtering deposition to obtain a pH sensor;
wherein the RF sputtering deposition is performed with a titanium target under conditions of a mixture of Ar and N2 at a ratio of 1;
2 to 1;
5 and a flow rate of 60-90 sccm, a pressure of 0.01 to 0.04 torr, and a power of 85 to 120 W. - View Dependent Claims (2, 3, 4, 5)
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6. A pH sensor with an extended gate field effect transistor structure, comprising:
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a metal oxide semiconductor field effect transistor (MOSFET);
an extended gate as a sensing unit, comprising a substrate, and a titanium nitride film thereon;
a conductive wire connecting the MOSFET and the sensing unit; and
an insulating layer covering the surface of the sensing unit and exposing the titanium nitride film. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
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Specification