Measurement apparatus, exposure apparatus, and device manufacturing method

• US 20070097341A1
• Filed: 06/21/2006
• Published: 05/03/2007
• Est. Priority Date: 06/22/2005
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Hikima, Ikuo
• Granted Patent: US 7,924,416 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70525 Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
• CPC Class Codes: G03F 7/70558 Dose control, i.e. achievement of a desired dose
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Abstract

A substrate stage holds a substrate irradiated with exposure light via a liquid. A measurement apparatus measures information on the exposure light and has a light receiving device detachable from the substrate stage. The light receiving device receives the exposure light while being held in the substrate stage.

Claims

1. A measurement apparatus for measuring information on exposure light, comprising

a light receiving device that is detachable from a substrate stage and receives the exposure light while being held by the substrate stage, the substrate stage holding a substrate, the substrate being irradiated with the exposure light via a liquid.

2. The measurement apparatus according to claim 1, wherein

the light receiving device is detachable from a substrate holder provided on the substrate stage and holding the substrate.

3. The measurement apparatus according to claim 1, wherein

the light receiving device has substantially the same outline as the substrate.

4. The measurement apparatus according to claim 1, wherein

the light receiving device has liquid-repellency to the liquid.

5. The measurement apparatus according to claim 1, wherein

the light receiving device comprises a transmission member that transmits the exposure light, and a light receiving device that receives the exposure light that has passed through the transmission member.

6. The measurement apparatus according to claim 5, wherein

a liquid immersion region is formed on an upper surface of the transmission member.

7. The measurement apparatus according to claim 5, wherein

the light receiving device comprises a base that holds the transmission member and has an inner space in which the light receiving device is disposed.

8. The measurement apparatus according to claim 1, wherein

the light receiving device comprises a first surface on which the liquid is disposed, and a second surface located outside the first surface and having liquid-repellency.

9. The measurement apparatus according to claim 8, wherein

the first surface and the second surface are substantially flush with each other.

10. The measurement apparatus according to claim 8, wherein

a height difference is provided between the first surface and the second surface.

11. The measurement apparatus according to claim 1, further comprising

a retainer that retains a light reception result of the light receiving device.

12. The measurement apparatus according to claim 1, further comprising

a transmitter that wirelessly transmits a light reception result of the light receiving device.

13. The measurement apparatus according to claim 1, wherein

illuminance of the exposure light is measured.

14. An exposure apparatus that exposes a substrate with exposure light via a liquid, comprising

a movable body that detachably supports the measurement apparatus according to claim 1.

22. A device manufacturing method using the exposure apparatus according to claim 14.

15. An exposure apparatus that exposes a substrate via a liquid, comprising:

a substrate stage that holds the substrate; and

a measurement apparatus that measures information on exposure light, wherein

the measurement apparatus is detachable from the substrate stage and has a light receiving device that receives the exposure light via the liquid while being held in the substrate stage.

16. The exposure apparatus according to claim 15, further comprising

a transport apparatus that transports the light receiving device to the substrate stage.

17. The exposure apparatus according to claim 15, further comprising

a liquid immersion mechanism that forms a liquid immersion region on one surface of the light receiving device.

18. The exposure apparatus according to claim 17, wherein

the liquid immersion mechanism starts, at the one surface of the light receiving device, a liquid supply to form the liquid immersion region.

19. The exposure apparatus according to claim 17, wherein

a liquid supply and recovery in the liquid immersion mechanism is performed in parallel with the measurement of the exposure light in the measurement apparatus.

20. The exposure apparatus according to claim 15, wherein

the substrate stage comprises a third surface that is located outside the light receiving device, the third surface being substantially flush with one surface or a surface thereoutside of the light receiving device, the one surface on which the liquid is disposed.

21. The exposure apparatus according to claim 15, wherein

the substrate stage comprises an inner side surface that faces a side surface of the light receiving device, a predetermined gap being formed between the inner side surface and the side surface of the light receiving device.

23. A device manufacturing method using the exposure apparatus according to claim 15.