Method for an element using two resist layers
First Claim
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1. A method of forming an element, comprising:
- forming a first resist layer on top of a substrate;
forming a seed layer on top of at least a portion of the first resist layer;
forming a second resist layer over a portion of the seed layer;
electroplating a conductive layer over exposed portions of the seed layer; and
removing the first and second resist.
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Abstract
A two resist layer process allows a seed layer to be used to electroplate a conductive layer of an element in a way that a portion of the seed layer can be removed.
42 Citations
21 Claims
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1. A method of forming an element, comprising:
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forming a first resist layer on top of a substrate;
forming a seed layer on top of at least a portion of the first resist layer;
forming a second resist layer over a portion of the seed layer;
electroplating a conductive layer over exposed portions of the seed layer; and
removing the first and second resist. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 19)
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11. An element constructed by the process of:
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forming a first resist layer on top of a substrate;
forming a seed layer on top of at least a portion of the first resist layer;
forming a second resist layer over a portion of the seed layer;
electroplating a conductive layer over exposed portions of the seed layer; and
removing the first and second resist. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18)
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20. An RFID antenna constructed by the process of:
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forming a first resist layer on top of a substrate;
forming a seed layer on top of at least a portion of the first resist layer;
forming a second resist layer over a portion of the seed layer;
electroplating a conductive layer over exposed portions of the seed layer; and
removing the first and second resist. - View Dependent Claims (21)
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Specification