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Sputtering target including titanium silicon oxide and method of making coated article using the same

  • US 20070108043A1
  • Filed: 11/14/2005
  • Published: 05/17/2007
  • Est. Priority Date: 11/14/2005
  • Status: Abandoned Application
First Claim
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1. A target for use in sputter depositing a layer(s) on a substrate, the target comprising a target material comprising Ti1-xSixOy where x is from about 0.05 to 0.95 and y is from about 0.2 to 1.95.

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