Thermally isolated membrane structure
First Claim
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1. A microelectromechanical device, comprising:
- a semiconductor substrate having an upper and lower surface;
a membrane support structure disposed at least partially in said semiconductor substrate, said support structure including a plurality of support members, said plurality of support members oriented to define a plurality of cells in said semiconductor substrate, each of said plurality of cells defining a cell space;
a thermally isolated membrane disposed above said upper surface of said semiconductor substrate and supported by said support members; and
at least one functional component mounted to said membrane, said plurality of cells located substantially beneath said at least one functional component.
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Abstract
An MEMS device including a semiconductor substrate having an upper and lower surface, and a support structure disposed at least partially in the semiconductor substrate. The support structure includes a plurality of support members oriented to define a plurality of cells in the semiconductor substrate. A thermally isolated membrane is disposed above the upper surface of the semiconductor substrate and is supported by the support structure. At least one functional component is mounted to the membrane. The plurality of cells are located substantially beneath the at least one functional component.
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Citations
17 Claims
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1. A microelectromechanical device, comprising:
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a semiconductor substrate having an upper and lower surface;
a membrane support structure disposed at least partially in said semiconductor substrate, said support structure including a plurality of support members, said plurality of support members oriented to define a plurality of cells in said semiconductor substrate, each of said plurality of cells defining a cell space;
a thermally isolated membrane disposed above said upper surface of said semiconductor substrate and supported by said support members; and
at least one functional component mounted to said membrane, said plurality of cells located substantially beneath said at least one functional component. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method of making a microelectromechanical device, comprising the steps of:
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providing a semiconductor substrate having an upper surface and a lower surface;
forming a thermally isolated layer on both the upper and lower surfaces of the semiconductor substrate;
forming a plurality of support members in the upper thermally isolated layer and the semiconductor substrate, the support members defining a plurality of cells in the semiconductor substrate, each of the cells defining a cell space;
supporting a thermally isolated membrane on the plurality of support members; and
securing at least one functional component to the membrane at a position above the plurality of cells. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A method of making a microelectromechanical device, comprising the steps of:
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providing a semiconductor substrate having an upper surface and a lower surface;
forming a plurality of cells in the semiconductor substrate, each of the plurality of cells defining a cell space;
supporting a thermally isolated membrane on the cells;
securing at least one functional component to the membrane; and
forming a cavity in the semiconductor substrate and the lower thermally isolated layer, the cavity located substantially beneath the plurality of cells. - View Dependent Claims (16, 17)
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Specification