Exposure apparatus and an exposure method
First Claim
1. An exposure apparatus which forms a pattern on an object, comprising:
- a first holding member which holds an object;
a second holding member which holds an object;
a driving system which independently moves the first and second holding members in a two-dimensional plane;
an exposure portion, in which the first and second holding members are alternately provided so as to perform an exposure for the object held by each of the first and second holding members, including;
an exposure optical system of which a first portion is arranged in a first direction parallel to the two-dimensional plane and of which a second portion is arranged in a second direction perpendicular to the two-dimensional plane, and which irradiates onto the object an exposure beam from the first portion via the second portion; and
a first interferometer system which obtains positional information of one of the first and second holding members provided in the exposure portion;
a measurement portion, in which the first and second holding members are alternately provided so as to perform a measurement for the objects held by the first and second holding members, respectively, including a measurement system which is arranged apart from the second portion of the exposure optical system with respect to the first direction, and a second interferometer system which obtains positional information of the other of the first and second holding members provided in the measurement portion;
wherein each of the first and second holding members has a reflective surface used for the first and second interferometer systems; and
the other of the first and second holding members in the measurement portion is provided in the exposure portion in exchange for the one of the first and second holding members after the measurement of the object held by the other of the first and second holding members.
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Accused Products
Abstract
A scanning exposure apparatus includes a projection system, a stage system, a first detector and a control system. The stage system has first and second stages, each of which is movable independently in a plane while holding a substrate. The first detector detects focusing information of a vicinity of an outer circumference of the substrate during a detecting operation. The control system controls the stage system to perform the detecting operation with the first stage, while performing a first exposure operation on the substrate held by the second stage. After the first exposure operation, a second exposure operation for the substrate held on the first stage is performed, in which a shot area in the vicinity of the outer circumference of the substrate is exposed by moving the first stage while adjusting a position of the substrate surface held by the first stage using the detected focusing information.
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Citations
40 Claims
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1. An exposure apparatus which forms a pattern on an object, comprising:
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a first holding member which holds an object;
a second holding member which holds an object;
a driving system which independently moves the first and second holding members in a two-dimensional plane;
an exposure portion, in which the first and second holding members are alternately provided so as to perform an exposure for the object held by each of the first and second holding members, including;
an exposure optical system of which a first portion is arranged in a first direction parallel to the two-dimensional plane and of which a second portion is arranged in a second direction perpendicular to the two-dimensional plane, and which irradiates onto the object an exposure beam from the first portion via the second portion; and
a first interferometer system which obtains positional information of one of the first and second holding members provided in the exposure portion;
a measurement portion, in which the first and second holding members are alternately provided so as to perform a measurement for the objects held by the first and second holding members, respectively, including a measurement system which is arranged apart from the second portion of the exposure optical system with respect to the first direction, and a second interferometer system which obtains positional information of the other of the first and second holding members provided in the measurement portion;
wherein each of the first and second holding members has a reflective surface used for the first and second interferometer systems; and
the other of the first and second holding members in the measurement portion is provided in the exposure portion in exchange for the one of the first and second holding members after the measurement of the object held by the other of the first and second holding members. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. An exposure method of forming a pattern on an object, comprising:
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providing a first holding member which holds an object in an exposure portion including an exposure optical system of which a first portion is arranged in a first direction parallel to a two-dimensional plane and a second portion is arranged in a second direction perpendicular to the two-dimensional plane, and a first interferometer system;
exposing the object with an exposure beam via the exposure optical system, while moving the first holding member on the two-dimensional plane by a driving system and measuring positional information of the first holding member by the first interferometer system;
providing a second holding member which holds an object in a measurement portion including a second interferometer system, and a measurement system arranged apart from the second portion of the exposure optical system with respect to the first direction;
measuring alignment information of the object by the measurement system, while moving the second holding member by the driving system and measuring positional information of the second holding member by the second interferometer system;
providing the second holding member in the exposure portion in exchange for the first holding member which holds the exposed object after the measurement of the alignment information; and
exposing the object held by the second holding member with the exposure beam via the exposure optical system based on the alignment information, while moving the second holding member on the two-dimensional plane by the driving system and measuring positional information of the second holding member by the first interferometer system;
wherein each of the first and second holding members has a reflective surface used for the first and second interferometer systems. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40)
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Specification