Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method

• US 20070109522A1
• Filed: 10/23/2006
• Published: 05/17/2007
• Est. Priority Date: 10/24/2005
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Takahashi, Masato, Ebihara, Akimitsu
• Granted Patent: US 8,681,314 B2
• Time in Patent Office: Days
• US Class Current: 355/72
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 7/70783 Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Abstract

A stage device includes a base, a movable table arranged above the base, a position information measurement device that measures position information of the movable table, a deformation amount detection unit that detects an amount regarding deformation of at least one of the base and the movable table, and a correction device that corrects the measured result of the position information measurement unit based on the detected result of the deformation amount detection unit.

Claims

1. A stage device, comprising:

a base;

a movable table arranged on the base;

a position information measurement device that measures position information of the movable table; and

a deformation amount detection device that detects an amount regarding deformation of at least one of the base and the movable table.

2. The stage device according to claim 16, wherein

the position information measurement device includes an interferometer, and

the deformation amount detection device includes a strainmeter that measures an amount of strain of the base or the movable table.

3. The stage device according to claim 2, wherein

the correction device calculates strain data in accordance with a position where the strainmeter is provided, and corrects position information of the interferometer based on the strain data.

4. The stage device according to claim 1, further comprising:

a transmitting device that transmits electric utilities to and from the deformation amount detection device in a non-contact manner.

5. The stage device according to claim 4, wherein

the electric utilities includes electric power that is utilized in the deformation amount detection device and the amount regarding deformation that is measured by the deformation amount detection device.

6. The stage device according to claim 1, wherein

the deformation amount detection device detects an amount regarding deformation in at least one direction among deformations in three axis directions perpendicular to each other that occur in the movable table.

7. The stage device according to claim 1, wherein

the deformation amount detection device detects amounts regarding deformations in three axis directions perpendicular to each other that occur in the movable table.

8. The stage device according to claims 1, wherein

the deformation amount detection device detects an amount regarding the deformation that occurs while the movable table is moving.

9. An exposure apparatus that transfers a pattern onto a substrate, wherein

the stage device as recited in claim 1 is used to drive the substrate.

10. The exposure apparatus according to claim 9, wherein

the deformation amount detection device detects an amount regarding the deformation that occurs in the movable table when the movable table is moved in association with the exposure.

11. A device manufacturing method using the exposure apparatus as recited in claim 9.

16. The stage device according to claim 1, further comprising:

a correction device that corrects a measured result of the position information measurement device based on a detected result of the deformation amount detection device.

12. A coordinate correction method for a stage device, comprising the steps of:

measuring position information of a movable table on a base by utilizing a position information measurement device;

detecting an amount regarding deformation of at least one of the base and the movable table by a deformation amount detection device provided on at least one of the base and the movable table;

calculating strain data from the detected amount regarding the deformation by a calculating device; and

correcting the position information measured by the position information measurement device based on the strain data by a correction device.

13. The coordinate correction method for a stage device according to claim 12, further comprising the step of:

measuring position information of the movable table by the position information measurement device and calculating a surface profile of the movable table from the measured position information;

wherein

the correction device corrects the position information measured by the position information measurement device based on the surface profile and the strain data.

14. The coordinate correction method for a stage device according to claim 12 further comprising the step of:

transmitting electric utilities to and from the deformation amount detection device in a non-contact manner;

wherein

the electric utilities include the amount regarding the deformation detected by the deformation amount detection device.

15. The coordinate correction method for a stage device according to claim 12, wherein

the position information measurement device includes an interferometer, and

the deformation amount detection device includes a strainmeter that measures an amount of strain of the base or the movable table.