Display device and manufacturing method of the same
First Claim
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1. A manufacturing method of a display device, comprising the steps of:
- forming a first conductive film;
selectively forming a resist over the first conductive film;
forming a second conductive film over the first conductive film and the resist;
removing the second conductive film formed over the resist by removing the resist;
forming a third conductive film so as to cover the second conductive film formed over the first conductive film; and
selectively etching the first conductive film and the third conductive film so as to form a wiring.
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Abstract
A plurality of wires and electrodes are formed by forming a first conductive film, selectively forming a resist over the first conductive film, forming a second conductive film over the first conductive film and the resist, removing the second conductive film formed over the resist by removing the resist, forming a third conductive film so as to cover the second conductive film formed over the first conductive film, and selectively etching the first conductive film and the third conductive film. Thus, wires using a low resistance material can be formed in a large-sized panel, and thus, a problem of signal delay can be solved.
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Citations
70 Claims
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1. A manufacturing method of a display device, comprising the steps of:
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forming a first conductive film;
selectively forming a resist over the first conductive film;
forming a second conductive film over the first conductive film and the resist;
removing the second conductive film formed over the resist by removing the resist;
forming a third conductive film so as to cover the second conductive film formed over the first conductive film; and
selectively etching the first conductive film and the third conductive film so as to form a wiring. - View Dependent Claims (5, 6, 7, 8, 9)
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2. A manufacturing method of a display device, comprising the steps of:
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forming a first conductive film;
selectively forming a resist over the first conductive film;
forming a second conductive film over the first conductive film and the resist;
removing the second conductive film formed over the resist by removing the resist;
forming a third conductive film so as to cover the second conductive film formed over the first conductive film;
selectively etching the first conductive film and the third conductive film so as to form a wiring;
forming a gate insulating film so as to cover the wiring;
forming a first semiconductor film over the gate insulating film;
selectively forming a channel protective film over the first semiconductor film;
forming a second semiconductor film doped with an impurity element over the channel protective film and the first semiconductor film;
forming a fourth conductive film over the second semiconductor film;
selectively etching the first semiconductor film, the second semiconductor film, and the fourth conductive film;
forming a protective film over the fourth conductive film;
selectively etching the protective film; and
forming a pixel electrode so as to be electrically connected to the fourth conductive film. - View Dependent Claims (10, 11, 12, 13, 14)
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3. A manufacturing method of a display device, comprising the steps of:
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forming a first conductive film;
selectively forming a resist over the first conductive film;
forming a second conductive film over the first conductive film and the resist;
removing the second conductive film formed over the resist by removing the resist;
forming a third conductive film so as to cover the second conductive film formed over the first conductive film;
selectively etching the first conductive film and the third conductive film so as to form a wiring;
forming a gate insulating film so as to cover the wiring;
forming a first semiconductor film over the gate insulating film;
forming a second semiconductor film doped with an impurity element over the first semiconductor film;
selectively etching the first semiconductor film and the second semiconductor film;
forming a fourth conductive film over the first semiconductor film and the second semiconductor film;
selectively etching the second semiconductor film, and the fourth conductive film;
forming a protective film over the fourth conductive film;
selectively etching the protective film; and
forming a pixel electrode so as to be electrically connected to the fourth conductive film. - View Dependent Claims (15, 16, 17, 18, 19)
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4. A manufacturing method of a display device, comprising the steps of:
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forming an insulating film;
forming a semiconductor film over the insulating film;
selectively etching the semiconductor film;
forming a gate insulating film over the semiconductor film which has been selectively etched;
forming a first conductive film over the gate insulating film;
selectively forming a resist over the first conductive film;
forming a second conductive film over the first conductive film and the resist;
removing the second conductive film formed over the resist by removing the resist;
forming a third conductive film so as to cover the second conductive film formed over the first conductive film; and
selectively etching the first conductive film and the third conductive film so as to form a wiring. - View Dependent Claims (20, 21, 22, 23, 24)
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25. A manufacturing method of a display device, comprising the steps of:
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forming a first conductive film;
selectively forming a first resist over the first conductive film;
forming a second conductive film over the first conductive film and the first resist;
removing the second conductive film formed over the first resist by removing the first resist;
forming a third conductive film so as to cover the second conductive film formed over the first conductive film;
selectively etching the first conductive film and the third conductive film so as to form a first wiring;
forming a gate insulating film so as to cover the first wiring;
forming a first semiconductor film over the gate insulating film;
forming a second semiconductor film doped with an impurity element over the first semiconductor film;
forming a fourth conductive film so as to be electrically connected to the second semiconductor film;
selectively forming a second resist over the fourth conductive film;
forming a fifth conductive film over the fourth conductive film and the second resist;
removing the fifth conductive film formed over the second resist by removing the second resist;
forming a sixth conductive film so as to cover the fifth conductive film formed over the fourth conductive film; and
selectively etching the fourth conductive film and the sixth conductive film so as to form a second wiring. - View Dependent Claims (27, 28, 29, 30, 31)
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26. A manufacturing method of a display device, comprising the steps of:
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forming a first insulating film;
forming a semiconductor film over the first insulating film;
selectively etching the semiconductor film;
forming a gate insulating film over the semiconductor film which has been selectively etched;
forming a first conductive film over the gate insulating film;
selectively forming a first resist over the first conductive film;
forming a second conductive film over the first conductive film and the first resist;
removing the second conductive film formed over the first resist by removing the first resist;
forming a third conductive film so as to cover the second conductive film formed over the first conductive film;
selectively etching the first conductive film and the third conductive film so as to form a first wiring;
forming a second insulating film over the first wiring;
selectively etching the gate insulating film and the second insulating film;
forming a fourth conductive film so as to be electrically connected to the semiconductor film;
selectively forming a second resist over the fourth conductive film;
forming a fifth conductive film over the fourth conductive film and the second resist;
removing the fifth conductive film formed over the second resist by removing the second resist;
forming a sixth conductive film so as to cover the fifth conductive film formed over the fourth conductive film; and
selectively etching the fourth conductive film and the sixth conductive film so as to form a second wiring. - View Dependent Claims (32, 33, 34, 35, 36)
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37. A display device comprising:
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a semiconductor film;
a gate wire;
a gate insulating film interposed between the semiconductor film and the gate wire; and
a source or drain wire electrically connected to the semiconductor film, wherein a first portion of the gate wire comprises;
a first conductive film and a second conductive film formed on the first conductive film, wherein an entire upper surface of the first conductive film is in contact with the second conductive film, and wherein a second portion of the gate wire comprises;
the first conductive film;
a third conductive film which is selectively formed over the first conductive film; and
the second conductive film formed so as to cover the third conductive film. - View Dependent Claims (40, 41, 42, 43, 44, 45, 46, 47, 48, 49)
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38. A display device comprising:
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a gate wire;
a gate insulating film formed over the gate wire;
a semiconductor film formed over the gate insulating film;
a semiconductor film doped with an impurity element which is formed over the semiconductor film; and
a source or drain wire which is electrically connected to the semiconductor film doped with the impurity element, wherein a first portion of the gate wire comprises;
a first conductive film and a second conductive film formed on the first conductive film, wherein an entire upper surface of the first conductive film is in contact with the second conductive film, and wherein a second portion of the gate wire comprises;
the first conductive film;
a third conductive film which is selectively formed over the first conductive film; and
the second conductive film formed so as to cover the third conductive film. - View Dependent Claims (50, 51, 52, 53, 54, 55, 56, 57, 58, 59)
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39. A display device comprising:
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a first insulating film;
a semiconductor film formed over the first insulating film;
a gate insulating film formed over the semiconductor film;
a gate wire formed over the gate insulating film;
a second insulating film formed over the gate wire; and
a source or drain wire which is electrically connected to the semiconductor film, wherein a first portion of the gate wire comprises;
a first conductive film and a second conductive film formed on the first conductive film, wherein an entire upper surface of the first conductive film is in contact with the second conductive film, and wherein a second portion of the gate wire comprises;
the first conductive film;
a third conductive film which is selectively formed over the first conductive film; and
the second conductive film formed so as to cover the third conductive film. - View Dependent Claims (60, 61, 62, 63, 64, 65, 66, 67, 68, 69)
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70. A display device comprising:
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a pixel portion; and
a leading wiring electrically connected to the pixel portion, wherein said leading wiring comprises;
a first leading wire having a first length; and
a second leading wire having a second length, wherein said first leading wire and said second leading wire comprise;
a first conductive film;
a second conductive film selectively formed over the first conductive film; and
a third conductive film formed so as to cover the second conductive film, wherein said second conductive film is formed such that resistances of the first leading wire and the second leading wire are almost equal to each other.
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Specification
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Current AssigneeSemiconductor Energy Laboratory Co., Ltd.
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Original AssigneeSemiconductor Energy Laboratory Co., Ltd.
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InventorsHosoya, Kunio, Fujikawa, Saishi
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Granted Patent
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Time in Patent OfficeDays
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Field of Search
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US Class Current430/311
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CPC Class CodesH01L 27/124 with a particular compositi...H01L 27/1288 employing particular maskin...H01L 29/4908 for thin film semiconductor...H10K 10/481 characterised by the gate c...H10K 59/1315 comprising structures speci...H10K 71/00 Manufacture or treatment sp...H10K 71/166 using selective deposition,...H10K 71/231 by etching of existing layersH10K 71/621 Providing a shape to conduc...
