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Method and system for performing different deposition processes within a single chamber

  • US 20070116888A1
  • Filed: 11/18/2005
  • Published: 05/24/2007
  • Est. Priority Date: 11/18/2005
  • Status: Abandoned Application
First Claim
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1. A method for material deposition on a substrate in a vapor deposition system, comprising:

  • disposing said substrate in said vapor deposition system having a first process space defined above the substrate;

    introducing a first process gas composition to said first process space according to a first vapor deposition process;

    depositing a first film on said substrate;

    introducing a second process gas composition into a second process space different in size from the first process space; and

    depositing a second film on said substrate from the second process gas composition.

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