Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby

• US 20070117028A1
• Filed: 11/15/2006
• Published: 05/24/2007
• Est. Priority Date: 03/01/2001
• Status: Abandoned Application

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Heerens, Gert-Jan, Ham, Erik, Wilhelmus Marinus Van De Ven, Bastiaan
• Application Number:
  US11/599,585
• Publication Number:
  US 20070117028A1
• Time in Patent Office: Days
• US Class Current: 430/5
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70741 Handling masks outside exposure position, e.g. reticle libraries

Abstract

A mask for use in a lithographic projection apparatus comprises three brackets arranged on the circumference of the mask. The brackets are provided with grooves directed to a common imaginary point and are intend to cooperate with three pins provided on a mask gripper present in a mask handling apparatus or device. Preferably, the pins are provided with a rounded top for insertion in associated grooves of the brackets to provide a kinematically-determined mechanical position of the mask on the gripper.

Claims

1-25. -25. (canceled)

26. A storage container configured to hold a mask suitable to pattern a projection beam of radiation in a lithographic projection apparatus, the container comprising:

a frame constructed to removably support the mask on the front or back major surface of the mask, the frame comprising a plurality of first connecting structures, each first connecting structure configured to cooperate with a respective second connecting structure of a plurality of second connecting structures;

a base comprising the plurality of second connecting structures configured to removably support the frame, a surface of the frame displaced from a substantially parallel surface of the base when the frame is supported on the base; and

a cover configured to extend around and over the frame such that the mask, when supported by the frame, is completely surrounded by and sealed within the base and the cover,

wherein the cover, base and frame are configured to be displaced together by a container handling mechanism.

27. The container of claim 26, wherein the plurality of first connecting structures comprises at least three recesses arranged in a triangular manner and the plurality of second connecting structures comprises at least three protrusions arranged in a triangular manner.

28. The container of claim 27, wherein the at least three first connecting structures each comprise a groove and the grooves are substantially oriented towards a common point.

29. The container of claim 26, wherein the frame is configured to hold the mask by employing only a non-contact force, selected from gravity, a magnetic force or a combination thereof.

30. The container of claim 26, wherein the plurality of first connecting structures and the plurality of second connecting structures hold the frame in a self-aligning manner.

31. The container of claim 26, wherein the mask is a reflective mask suitable to pattern a projection beam of extreme ultraviolet electromagnetic radiation in a lithographic projection apparatus.

32. The container of claim 26, wherein the cover comprises a first major portion extending in a first direction and a second direction orthogonal to the first direction, and a second minor portion extending in a third direction orthogonal to the first and second directions, the second portion in contact with the base when the cover extends around and over the frame.

33. The container of claim 26, wherein a portion of the surface of the frame defines an aperture that extends through the frame so that the front or back major surface of the mask, when supported by the frame, is accessible by a beam of radiation.

34. The container of claim 26, wherein the frame comprises a surface extending in a first direction and a second direction orthogonal to the first direction to support the mask on the front or back major surface of the mask, and a surface extending in a third direction orthogonal to the first and second directions to constrain the mask from moving in the first or second direction.

35. A mask holder configured to hold a mask suitable to pattern a projection beam of radiation in a lithographic projection apparatus, the mask holder comprising:

a frame constructed to removably support the mask on the front or back major surface of the mask, the frame comprising a plurality of first connecting structures, each first connecting structure configured to cooperate with a respective second connecting structure of a plurality of second connecting structures;

a base comprising the plurality of second connecting structures configured to removably support the frame, a surface of the frame displaced from a substantially parallel surface of the base when the frame is supported on the base,

wherein the base and frame are configured to be displaced together by a mask holder handling mechanism.

36. The mask holder of claim 35, wherein the plurality of first connecting structures comprises at least three recesses arranged in a triangular manner and the plurality of second connecting structures comprises at least three protrusions arranged in a triangular manner.

37. The mask holder of claim 35, wherein a portion of the surface of the frame defines an aperture that extends through the frame so that the front or back major surface of the mask, when supported by the frame, is accessible by a beam of radiation.

38. The mask holder of claim 35, wherein the frame comprises a surface extending in a first direction and a second direction orthogonal to the first direction to support the mask on the front or back major surface of the mask, and a surface extending in a third direction orthogonal to the first and second directions to constrain the mask from moving in the first or second direction.

39. The mask holder of claim 35, wherein the frame is configured to hold the mask by employing only a non-contact force, selected from gravity, a magnetic force or a combination thereof.

40. A mask holder configured to hold a mask suitable to pattern a projection beam of radiation in a lithographic projection apparatus, the mask holder comprising:

a frame extending in a plane defined by a first direction and a second direction orthogonal to the first direction, the frame comprising a surface in the plane to support the mask on the front or back major surface of the mask and a surface extending in a third direction orthogonal to the first and second directions to constrain the mask from moving in the plane;

a base comprising at least three protrusions configured to removably support the frame, a surface of the frame displaced from a substantially parallel surface of the base when the frame is supported on the base,

wherein the base and frame are configured to be displaced together by a mask holder handling mechanism.

41. The mask holder of claim 40, further comprising a cover configured to extend around and over the frame such that the mask, when supported by the frame, is completely surrounded by and sealed within the base and the cover.

42. The mask holder of claim 41, wherein the cover comprises a first major portion extending in the first direction and second directions, and a second minor portion extending in the third direction, the second portion in contact with the base when the cover extends around and over the frame.

43. The mask holder of claim 40, wherein a portion of the surface of the frame defines an aperture that extends through the frame so that the front or back major surface of the mask, when supported by the frame, is accessible by a beam of radiation.

44. The mask holder of claim 40, wherein the frame comprises at least three recesses configured to cooperate with the at least three protrusions of the base.

45. The mask holder of claim 40, wherein the frame is configured to hold the mask by employing only a non-contact force, selected from gravity, a magnetic force or a combination thereof.

46. A mask handling method, comprising:

supplying a mask to a frame so that the mask is removably supported on the frame by the front or back major surface of the mask;

moving a base supporting the frame to a substrate processing apparatus, the base comprising a plurality of structures configured to removably support the frame, a surface of the frame displaced from a substantially parallel surface of the base;

displacing the frame with the mask from the base; and

displacing the mask to a substrate table of a lithographic projection apparatus.

47. The method of claim 46, wherein the substrate processing apparatus is the lithographic projection apparatus.

48. The method of claim 46, wherein moving a base supporting the frame further comprises moving a cover extending around and over the frame such that the frame is completely surrounded by and sealed within the base and the cover.

49. The method of claim 46, further comprising holding the mask on the frame by employing only a non-contact force, selected from gravity, a magnetic force or a combination thereof.