Plating method and apparatus
First Claim
1. A plating method comprising:
- applying an ultraviolet ray to a surface of a substrate; and
plating the surface of the substrate after said applying process.
1 Assignment
0 Petitions
Accused Products
Abstract
A plating method comprising applying an ultraviolet ray to a surface of a substrate or exposing a surface of a substrate to an ozone gas or bringing a surface to a substrate into contact with ozone water or bringing a surface of a substrate into contact with electrolytic ionized water or performing a team treatment using steam on a surface of a substrate, and plating the surface of the substrate after said applying, exposing, bringing or performing process. A plating method comprising performing a team treatment using steam on a surface of a substrate, and performing a wet process on the surface of the substrate of a substrate with an acidic plating solution, cleaning the surface of the substrate with pure water and cleaning the surface of the substrate with an alkalescent aqueous solution. A plating apparatus adapted to perform at least one of said methods.
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Citations
43 Claims
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1. A plating method comprising:
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applying an ultraviolet ray to a surface of a substrate; and
plating the surface of the substrate after said applying process. - View Dependent Claims (2, 3, 18)
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4. A plating method comprising:
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exposing a surface of a substrate to an ozone gas; and
plating the surface of the substrate after said exposing process. - View Dependent Claims (5, 6)
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7. A plating method comprising:
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bringing a surface of a substrate into contact with ozone water; and
plating the surface of the substrate after said bringing process. - View Dependent Claims (8, 9)
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10. A plating method comprising:
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bringing a surface of a substrate into contact with electrolytic ionized water; and
plating the surface of the substrate after said bringing process. - View Dependent Claims (11, 12)
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13. A plating method comprising:
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plating a surface of a substrate with an acidic plating solution;
cleaning the surface of the substrate with pure water after said plating process; and
cleaning the surface of the substrate with an alkalescent aqueous solution after said plating process. - View Dependent Claims (14)
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15. A plating method comprising:
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performing a steam treatment using steam on a surface of a substrate; and
bringing the surface of the substrate into contact with a plating solution after said steam treatment so as to form a plated film on the surface of the substrate. - View Dependent Claims (16, 17)
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19. A substrate processing method comprising:
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performing a steam treatment using steam on a surface of a substrate; and
performing a wet process on the surface of the substrate after said steam treatment.
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20. A plating apparatus comprising:
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an ultraviolet ray radiation chamber configured to apply an ultraviolet ray to a surface of a substrate;
a plating chamber configured to plate the surface of the substrate to which the ultraviolet ray is applied; and
a frame housing at least said ultraviolet ray radiation chamber and said plating chamber. - View Dependent Claims (21, 22, 37, 38, 39, 40, 41, 42, 43)
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23. A plating apparatus comprising:
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an ozone gas exposure chamber configured to expose a surface of a substrate to an ozone gas;
a plating chamber configured to plate the surface of the substrate exposed to the ozone gas; and
a frame housing at least said ozone gas exposure chamber and said plating chamber. - View Dependent Claims (24, 25)
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26. A plating apparatus comprising:
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an ozone water process chamber configured to bring a surface of a substrate into contact with ozone water;
a plating chamber configured to plate the surface of the substrate brought into contact with the ozone water; and
a frame housing at least said ozone water process chamber and said plating chamber. - View Dependent Claims (27, 28)
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29. A plating apparatus comprising:
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an electrolytic ionized water process chamber configured to bring a surface of a substrate into contact with electrolytic ionized water;
a plating chamber configured to plate the surface of the substrate brought into contact with the electrolytic ionized water; and
a frame housing at least said electrolytic ionized water process chamber and said plating chamber. - View Dependent Claims (30, 31)
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32. A plating apparatus comprising:
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a plating chamber configured to plate a surface of a substrate with an acidic plating solution;
a first cleaning chamber configured to clean the plated surface of the substrate with pure water;
a second cleaning chamber configured to clean the plated surface of the substrate with an alkalescent aqueous solution; and
a frame housing at least said plating chamber, said first cleaning chamber, and said second cleaning chamber. - View Dependent Claims (33)
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34. A plating apparatus comprising:
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a steam treatment chamber configured to perform a steam treatment using steam on a surface of a substrate;
a plating chamber configured to plate the surface of the substrate subjected to the steam treatment; and
a frame housing at least said steam treatment chamber and said plating chamber. - View Dependent Claims (35, 36)
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Specification