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CHEMICAL VAPOR DEPOSITION CHAMBER WITH DUAL FREQUENCY BIAS AND METHOD FOR MANUFACTURING A PHOTOMASK USING THE SAME

  • US 20070119373A1
  • Filed: 11/29/2006
  • Published: 05/31/2007
  • Est. Priority Date: 07/29/2005
  • Status: Active Grant
First Claim
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1. A chemical vapor deposition (CVD) chamber comprising:

  • a chamber body;

    a substrate support disposed in an interior volume of the chamber body;

    an electrode embedded in the substrate support;

    a first RF power source coupled to the electrode;

    a second RF power source coupled to the electrode;

    a showerhead disposed in the interior volume of the chamber body and defining a plenum between the chamber body;

    a third RF power source coupled to the showerhead; and

    a gas panel coupled to the chamber body and providing a source of a hydrocarbon compound to the interior volume through the showerhead.

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