Display device and method for fabricating the same
First Claim
1. A display device comprising:
- a first transistor including a first gate electrode;
a second transistor including a second gate electrode which is connected to a first drain electrode of the first transistor;
an insulating film provided so as to cover the first and the second transistors;
a first electrode of an electroluminescent layer, which is connected to a second drain electrode of the second transistor; and
a second electrode of the electroluminescent layer, which is provided over the electroluminescent layer.
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Accused Products
Abstract
It is an object of the invention to provide a display device which can be manufactured by a simplified manufacturing process by which the efficiency in the use of material is improved. It is a further object of the invention to provide a manufacturing method of the display device. It is another object of the invention to provide a fabrication technology for improving adhesion of a pattern. In view of the above problems, according to the present invention, a pattern is formed by a droplet discharge method. Particularly in the invention, base pretreatment is performed before/after a pattern is formed by a droplet discharge method. As a result of such base pretreatment, adhesion of a pattern can improved, and the pattern may be made finer.
72 Citations
47 Claims
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1. A display device comprising:
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a first transistor including a first gate electrode;
a second transistor including a second gate electrode which is connected to a first drain electrode of the first transistor;
an insulating film provided so as to cover the first and the second transistors;
a first electrode of an electroluminescent layer, which is connected to a second drain electrode of the second transistor; and
a second electrode of the electroluminescent layer, which is provided over the electroluminescent layer. - View Dependent Claims (5, 6, 7, 9, 10, 11)
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2. A display device comprising:
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a first transistor including a first gate electrode which is formed by a droplet discharge method;
a second transistor including a second gate electrode which is connected to a first drain electrode of the first transistor;
an insulating film provided so as to cover the first and the second transistors;
a first electrode of an electroluminescent layer, which is connected to a second drain electrode of the second transistor; and
a second electrode of the electroluminescent layer, which is provided over the electroluminescent layer. - View Dependent Claims (8)
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3. A display device comprising:
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a first transistor including a first gate electrode which is formed by a droplet discharge method;
a second transistor including a second gate electrode which is connected to a first drain electrode of the first transistor;
a first insulating film provided so as to cover the first and the second transistors;
a second insulating film containing nitrogen, which is formed so as to cover the first insulating film;
a cathode of an electroluminescent layer, which is connected to a second drain electrode of the second transistor; and
an anode of the electroluminescent layer, which is provided over the electroluminescent layer.
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4. A display device comprising:
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a first transistor including a first gate electrode which is formed by a droplet discharge method;
a second transistor including a second gate electrode which is connected to a first drain electrode of the first transistor;
a first insulating film provided so as to cover the first and the second transistors;
a second insulating film containing nitrogen, which is formed so as to cover the first insulating film;
a cathode of an electroluminescent layer, which is connected to a second drain electrode of the second transistor; and
an anode of the electroluminescent layer, which is provided over the electroluminescent layer, wherein the cathode, an electron injection layer, an electron transport layer, a light emitting layer, a hole transport layer, and a hole injection layer are stacked in order in the electroluminescent layer.
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12. A method for fabricating a display device, comprising the steps of:
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forming a first conductive film by applying a composition containing a conductor;
forming a semiconductor film over the first conductive film;
forming second conductive films over the semiconductor film by applying a composition containing a conductor, whereby a thin film transistor is formed;
forming a first insulating film so as to cover the thin film transistor;
forming a first electrode over the first insulating film;
forming a second insulating film so as to cover an end portion of the first electrode;
forming an electroluminescent layer in an opening provided for the second insulating film; and
forming a second electrode so as to cover the electroluminescent layer. - View Dependent Claims (14, 15, 16, 17, 42, 43)
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13. A method for fabricating a display device, comprising the steps of:
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forming a first conductive film by a droplet discharge method;
forming a semiconductor film over the first conductive film;
forming second conductive films over the semiconductor film by a droplet discharge method, whereby a thin film transistor is formed;
forming a first insulating film so as to cover the thin film transistor;
forming a first electrode over the first insulating film;
forming a second insulating film so as to cover an end portion of the first electrode;
forming an electroluminescent layer in an opening provided for the second insulating film; and
forming a second electrode so as to cover the electroluminescent layer. - View Dependent Claims (47)
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18. A method for fabricating a display device, comprising the steps of:
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forming a first and a second gate electrodes by a droplet discharge method;
forming a semiconductor film over the gate electrodes;
forming masks over the semiconductor film;
patterning the semiconductor film using the masks;
forming a first and a second source electrodes and a first and a second drain electrodes over the patterned semiconductor films by a droplet discharge method, whereby thin film transistors are formed;
forming a columnar conductive film over the second source electrode or the second drain electrode;
forming a first insulating film so as to cover the columnar conductive film and the thin film transistors;
forming a first electrode so as to connect to the columnar conductive film over the first insulating film;
forming a second insulating film so as to cover an end portion of the first electrode;
forming an electroluminescent layer in an opening provided for the second insulating film by a droplet discharge method; and
forming a second electrode so as to cover the electroluminescent layer. - View Dependent Claims (26, 27, 28, 29, 30)
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19. A method for fabricating a display device, comprising the steps of:
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forming a first and a second gate electrodes by a droplet discharge method;
forming a semiconductor film over the gate electrodes;
forming masks over the semiconductor film;
patterning the semiconductor film using the masks;
forming a first and a second source electrodes and a first and a second drain electrodes over the patterned semiconductor films by a droplet discharge method, whereby thin film transistors are formed;
forming a first insulating film so as to cover the thin film transistors;
forming a contact hole in the first insulating film over the second source electrode or the second drain electrode;
forming a columnar conductive film in the contact hole;
forming a first electrode so as to connect to the columnar conductive film;
forming a second insulating film so as to cover an end portion of the first electrode;
forming an electroluminescent layer in an opening provided for the second insulating film by a droplet discharge method; and
forming a second electrode so as to cover the electroluminescent layer. - View Dependent Claims (20)
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21. A method for fabricating a display device, comprising the steps of:
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forming a first and a second gate electrodes by a droplet discharge method;
forming a semiconductor film over the gate electrodes;
forming masks over the semiconductor film;
patterning the semiconductor film using the masks;
forming a first and a second source electrodes and a first and a second drain electrodes over the patterned semiconductor films by a droplet discharge method, whereby thin film transistors are formed;
forming a first insulating film so as to form an opening over the second source electrode or the second drain electrode;
forming a first electrode in the opening of the first insulating film;
forming a second insulating film so as to cover a part of the first electrode;
forming an electroluminescent layer in an opening provided for the second insulating film by a droplet discharge method; and
forming a second electrode so as to cover the electroluminescent layer.
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22. A method for fabricating a display device, comprising the steps of:
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forming a first and a second gate electrodes by a droplet discharge method;
forming a semiconductor film over the gate electrodes;
forming masks over the semiconductor film;
patterning the semiconductor film using the masks;
forming a first and a second source electrodes and a first and a second drain electrodes over the patterned semiconductor films by a droplet discharge method, whereby thin film transistors are formed;
forming a columnar organic film over the second source electrode or the second drain electrode;
forming a first insulating film so as to cover the columnar organic film and the thin film transistors;
removing the columnar organic film;
forming a first electrode so as to connect to the second source electrode or the second drain electrode over the first insulating film;
forming a second insulating film so as to cover an end portion of the first electrode;
forming an electroluminescent layer in an opening provided for the second insulating film by a droplet discharge method; and
forming a second electrode so as to cover the electroluminescent layer. - View Dependent Claims (23, 24)
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25. A method for fabricating a display device, comprising the steps of:
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forming a first and a second gate electrodes by a droplet discharge method;
forming a semiconductor film over the gate electrodes;
forming masks over the semiconductor film;
patterning the semiconductor film using the masks;
forming a first and a second source electrodes and a first and a second drain electrodes over the patterned semiconductor films by a droplet discharge method, whereby thin film transistors are formed;
forming an organic film which is repellent to a first insulating film on the surface of the second thin film transistor;
forming a mask over a part of the second source electrode or the second drain electrode;
removing the organic film using the mask;
forming an opening over the part of the second source electrode or the second drain electrode by forming the first insulating film after removing the mask;
forming a first electrode in the opening so as to connect to the second source electrode or the second drain electrode;
forming a second insulating film so as to cover a part of the first electrode;
forming an electroluminescent layer in an opening provided for the second insulating film by a droplet discharge method; and
forming a second electrode so as to cover the electroluminescent layer.
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31. A method for fabricating a display device, comprising the steps of:
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forming a first and a second source electrodes and a first and a second drain electrodes by a droplet discharge method;
forming a semiconductor film over the first and the second source electrodes and the first and the second drain electrodes;
forming masks over the semiconductor film;
patterning the semiconductor film using the masks;
forming a first and a second gate electrode over the patterned semiconductor films by a droplet discharge method, whereby thin film transistors are formed;
forming a columnar conductive film over the second source electrode or the second drain electrode;
forming a first insulating film so as to cover the columnar conductive film and the thin film transistors;
forming a first electrode so as to connect to the columnar conductive film over the first insulating film;
forming a second insulating film so as to cover an end portion of the first electrode;
forming an electroluminescent layer in an opening provided for the second insulating film by a droplet discharge method; and
forming a second electrode so as to cover the electroluminescent layer. - View Dependent Claims (32, 33, 34, 35)
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36. A method for fabricating a display device, comprising the steps of:
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forming a first and a second gate electrodes of a first and a second transistors by a droplet discharge method;
forming a semiconductor film over the first and the second gate electrodes with a gate insulating film therebetween;
forming a first and a second source electrodes and a first and a second drain electrodes of the first and the second transistors by a droplet discharge method over the semiconductor film;
forming a contact hole for connecting the first source electrode or the first drain electrode of the first transistor to the second gate electrode of the second transistor by etching the gate insulating film;
forming a conductive film in the contact hole by a droplet discharge method, whereby thin film transistors are formed;
forming a columnar conductive film over the second source electrode or the second drain electrode of the second transistor;
forming a first insulating film so as to cover the columnar conductive film and the first and the second thin film transistors;
forming a first electrode so as to connect to the columnar conductive film over the first insulating film;
forming a second insulating film so as to cover an end portion of the first electrode;
forming an electroluminescent layer in an opening provided for the second insulating film; and
forming a second electrode so as to cover the electroluminescent layer. - View Dependent Claims (38, 39, 40, 41)
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37. A method for fabricating a display device, comprising the steps of:
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forming a first and a second gate electrodes of a first and a second transistors by a droplet discharge method;
forming a semiconductor film over the first and the second gate electrodes with a gate insulating film therebetween;
patterning the semiconductor film;
forming a first and a second source electrodes and a first and a second drain electrodes of the first and the second transistors by a droplet discharge method over the patterned semiconductor films;
forming a contact hole for connecting the first source electrode or the first drain electrode of the first transistor to the second gate electrode of the second transistor by etching the gate insulating film using the source electrode and the drain electrode;
forming a conductive film in the contact hole by a droplet discharge method, whereby thin film transistors are formed;
forming a columnar conductive film over the second source electrode or the second drain electrode of the second transistor;
forming a first insulating film by a droplet discharge method so as to cover the columnar conductive film and the first and the second thin film transistors;
forming a first electrode so as to connect to the columnar conductive film over the first insulating film;
forming a second insulating film so as to cover an end portion of the first electrode;
forming an electroluminescent layer in an opening provided for the second insulating film by a droplet discharge method, and forming a second electrode so as to cover the electroluminescent layer.
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44. A method for fabricating a display device, comprising the steps of:
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preparing a treatment system including a first treatment chamber for droplet discharge and a second treatment chamber for planarization;
forming a conductive film and an insulating film over an object by a droplet discharge method in the first treatment chamber;
transferring the object into the second treatment chamber without exposure to the atmosphere; and
planarizing the conductive film and the insulating film in the second treatment chamber. - View Dependent Claims (45, 46)
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Specification