Lithographic apparatus and device manufacturing method
First Claim
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1. A method of transferring an image of a pattern from a patterning device onto a substrate with a lithographic apparatus, the method comprising:
- filtering a beam of radiation, patterned with the pattern of the patterning device, to substantially eliminate a zeroth non diffracted order from the image of the pattern transferred onto the substrate, the patterning device consisting of one of a chromeless phase shift mask and a high transmission attenuated phase shift mask having a percentage of transmission higher than about 10%; and
projecting the filtered patterned beam of radiation onto a substrate.
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Abstract
A method of configuring a transfer of an image of a pattern onto a substrate with a lithographic apparatus is presented. The method includes selecting a plurality of parameters including a pupil filter parameter; calculating an image of the pattern for the selected parameters; calculating a metric that represents a variation of an attribute of the calculated image over a process range; and adjusting the plurality of parameters based on a result of the metric.
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Citations
28 Claims
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1. A method of transferring an image of a pattern from a patterning device onto a substrate with a lithographic apparatus, the method comprising:
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filtering a beam of radiation, patterned with the pattern of the patterning device, to substantially eliminate a zeroth non diffracted order from the image of the pattern transferred onto the substrate, the patterning device consisting of one of a chromeless phase shift mask and a high transmission attenuated phase shift mask having a percentage of transmission higher than about 10%; and
projecting the filtered patterned beam of radiation onto a substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method of configuring a transfer of an image of a pattern onto a substrate with a lithographic apparatus, the method comprising:
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selecting a plurality of parameters including a pupil filter parameter;
calculating an image of the pattern for the selected parameters;
calculating a metric that represents a variation of an attribute of the calculated image over a process range; and
based on a result of the metric, iteratively (a) adjusting the pupil filter parameter, (b) calculating the image of the pattern and (c) calculating the metric until a substantially minimum or maximum value of variation of said attribute is obtained. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A lithographic apparatus, comprising:
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an illumination system configured to condition a beam of radiation;
a support structure configured to hold a patterning device, the patterning device configured to pattern the beam of radiation to form a patterned beam of radiation and consisting of one of a chromeless phase shift mask and a high transmission attenuated phase shift mask having a percentage of transmission higher than about 10%;
a substrate table configured to hold a substrate;
an optical system configured to project the patterned beam of radiation onto the substrate; and
a filter arranged in a pupil plane of the projection system and configured to substantially eliminate a zeroth non-diffracted order of the patterned beam of radiation from the patterned beam at the substrate. - View Dependent Claims (19, 20)
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21. A computer product having machine executable instructions, the instructions being executable by a machine to perform a method of configuring a transfer of an image of a pattern onto a substrate with a lithographic apparatus, the method comprising:
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selecting a plurality of parameters including a pupil filter parameter;
calculating an image of the pattern for the selected parameters;
calculating a metric that represents a variation of an attribute of the calculated image over a process range; and
based on a result of the metric, iteratively (a) adjusting the pupil filter parameter, (b) calculating the image of the pattern and (c) calculating the metric until a substantially minimum or maximum value of variation of said attribute is obtained. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28)
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Specification