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Lithographic apparatus and device manufacturing method

  • US 20070121090A1
  • Filed: 11/30/2005
  • Published: 05/31/2007
  • Est. Priority Date: 11/30/2005
  • Status: Abandoned Application
First Claim
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1. A method of transferring an image of a pattern from a patterning device onto a substrate with a lithographic apparatus, the method comprising:

  • filtering a beam of radiation, patterned with the pattern of the patterning device, to substantially eliminate a zeroth non diffracted order from the image of the pattern transferred onto the substrate, the patterning device consisting of one of a chromeless phase shift mask and a high transmission attenuated phase shift mask having a percentage of transmission higher than about 10%; and

    projecting the filtered patterned beam of radiation onto a substrate.

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