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Apparatus for optical inspection of wafers during polishing

  • US 20070123151A1
  • Filed: 01/29/2007
  • Published: 05/31/2007
  • Est. Priority Date: 05/23/1995
  • Status: Abandoned Application
First Claim
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1. A measurement station for use with a processing machine, which includes a processing station for processing an article and an exit station including an article transfer means and at least one articles'"'"' cassette, the measurement station being so dimensioned as to be installable in association with the exit station of the processing machine and comprising a spectrophotometric measuring unit and a holding unit for receiving and holding the article in a measuring position during measurements, said measuring unit comprising an optical system including an imaging system operable to locate measurements;

  • a beam directing assembly for directing illuminating light towards the article and directing collected light from the article towards a beam splitting assembly for separating a first portion of the collected light to propagate towards the spectrophotometric measuring unit and a second portion to propagate to said imaging system.

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