Multi-zone resistive heater
First Claim
Patent Images
1. An apparatus comprising:
- a stage comprising a body and a surface having an area to support a substrate;
a shaft coupled to the stage;
a first heating element disposed within a central region of the body of the stage; and
at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.
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Abstract
Apparatus, reactors, and methods for heating substrates are disclosed. The apparatus comprises a stage comprising a body and a surface having an area to support a substrate, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, and at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.
442 Citations
20 Claims
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1. An apparatus comprising:
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a stage comprising a body and a surface having an area to support a substrate;
a shaft coupled to the stage;
a first heating element disposed within a central region of the body of the stage; and
at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A heating system for a chemical vapor deposition apparatus comprising:
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a resistive heater including a body and a stage having a surface with an area to support a substrate;
a shaft coupled to the stage;
a first heating element disposed within a central region of the body of the stage for heating a first zone of the stage; and
at least second and third heating elements disposed within the body of the stage for respectively heating second and third zones of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other;
a temperature sensor for measuring the temperature of the central zone of the stage;
at least first, second and third power sources for respectively providing power to the first, second and third heating elements; and
a control system for controlling the first, second and third power sources. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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16. A method for resistive heating of substrates comprising:
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dividing a portion of a resistive heating element into a central region and at least two outer regions, each outer region only partially surrounding the central region;
providing each outer region a respective power ratio with respect to the central region;
measuring the temperature of the central region;
providing heating power to the central region according to the measured temperature; and
providing heating power delivered to each outer region according to the heating power delivered to the central region and the respective power ratio of the outer region. - View Dependent Claims (17, 18, 19, 20)
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Specification